Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide

S. G. Psakh'E, A. I. Lotkov, S. N. Meisner, L. L. Meisner, V. P. Sergeev, A. R. Sungatulin

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.

Original languageEnglish
Pages (from-to)457-463
Number of pages7
JournalInorganic Materials: Applied Research
Volume4
Issue number5
DOIs
Publication statusPublished - 2 Dec 2013

Fingerprint

Silicon
Ion beams
Surface treatment
Titanium
Microstructure
Chemical analysis
Oxides
titanium nickelide
Crystal microstructure
Nickel
Electron diffraction
Irradiation
Oxygen

Keywords

  • electron backscatter diffraction
  • fragmentation of the near-surface microstructure
  • high-dose ion implantation
  • silicon
  • surface modification
  • titanium nickelide

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide. / Psakh'E, S. G.; Lotkov, A. I.; Meisner, S. N.; Meisner, L. L.; Sergeev, V. P.; Sungatulin, A. R.

In: Inorganic Materials: Applied Research, Vol. 4, No. 5, 02.12.2013, p. 457-463.

Research output: Contribution to journalArticle

Psakh'E, S. G. ; Lotkov, A. I. ; Meisner, S. N. ; Meisner, L. L. ; Sergeev, V. P. ; Sungatulin, A. R. / Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide. In: Inorganic Materials: Applied Research. 2013 ; Vol. 4, No. 5. pp. 457-463.
@article{20bb10982fda4f6bbfac728d2b98cb80,
title = "Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide",
abstract = "Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20{\%} greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.",
keywords = "electron backscatter diffraction, fragmentation of the near-surface microstructure, high-dose ion implantation, silicon, surface modification, titanium nickelide",
author = "Psakh'E, {S. G.} and Lotkov, {A. I.} and Meisner, {S. N.} and Meisner, {L. L.} and Sergeev, {V. P.} and Sungatulin, {A. R.}",
year = "2013",
month = "12",
day = "2",
doi = "10.1134/S2075113313050134",
language = "English",
volume = "4",
pages = "457--463",
journal = "Inorganic Materials: Applied Research",
issn = "2075-1133",
publisher = "Springer Verlag",
number = "5",

}

TY - JOUR

T1 - Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide

AU - Psakh'E, S. G.

AU - Lotkov, A. I.

AU - Meisner, S. N.

AU - Meisner, L. L.

AU - Sergeev, V. P.

AU - Sungatulin, A. R.

PY - 2013/12/2

Y1 - 2013/12/2

N2 - Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.

AB - Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.

KW - electron backscatter diffraction

KW - fragmentation of the near-surface microstructure

KW - high-dose ion implantation

KW - silicon

KW - surface modification

KW - titanium nickelide

UR - http://www.scopus.com/inward/record.url?scp=84888378647&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84888378647&partnerID=8YFLogxK

U2 - 10.1134/S2075113313050134

DO - 10.1134/S2075113313050134

M3 - Article

AN - SCOPUS:84888378647

VL - 4

SP - 457

EP - 463

JO - Inorganic Materials: Applied Research

JF - Inorganic Materials: Applied Research

SN - 2075-1133

IS - 5

ER -