Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide

S. G. Psakh'E, A. I. Lotkov, S. N. Meisner, L. L. Meisner, V. P. Sergeev, A. R. Sungatulin

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Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect.

Original languageEnglish
Pages (from-to)457-463
Number of pages7
JournalInorganic Materials: Applied Research
Issue number5
Publication statusPublished - 2 Dec 2013



  • electron backscatter diffraction
  • fragmentation of the near-surface microstructure
  • high-dose ion implantation
  • silicon
  • surface modification
  • titanium nickelide

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

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