Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering

Zhilei Sun, K. E. Evdokimov, M. E. Konishchev, O. S. Kuzmin, V. F. Pichugin

Research output: Contribution to journalConference article

Abstract

The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

Original languageEnglish
Article number012083
JournalJournal of Physics: Conference Series
Volume1281
Issue number1
DOIs
Publication statusPublished - 12 Aug 2019
Event14th International Conference on Films and Coatings, ICFC 2019 - Saint Petersburg, Russian Federation
Duration: 14 May 201916 May 2019

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magnetron sputtering
annealing
wettability
anatase
rutile
film thickness
refractivity
temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering. / Sun, Zhilei; Evdokimov, K. E.; Konishchev, M. E.; Kuzmin, O. S.; Pichugin, V. F.

In: Journal of Physics: Conference Series, Vol. 1281, No. 1, 012083, 12.08.2019.

Research output: Contribution to journalConference article

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