Effect of post annealing on properties of N-doped TiO<sub>2</sub> films deposited by reactive magnetron sputtering

Abstract

The paper studies the effect of annealing on the structure and properties of N-doped TiO₂ films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

Original language	English
Article number	012083
Journal	Journal of Physics: Conference Series
Volume	1281
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/1281/1/012083
Publication status	Published - 12 Aug 2019
Event	14th International Conference on Films and Coatings, ICFC 2019 - Saint Petersburg, Russian Federation Duration: 14 May 2019 → 16 May 2019

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1088/1742-6596/1281/1/012083

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Sun, Z., Evdokimov, K. E., Konishchev, M. E., Kuzmin, O. S., & Pichugin, V. F. (2019). Effect of post annealing on properties of N-doped TiO₂ films deposited by reactive magnetron sputtering. Journal of Physics: Conference Series, 1281(1), [012083]. https://doi.org/10.1088/1742-6596/1281/1/012083

@article{d4603f7742734d2ba7adb8c19969cedd,

title = "Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering",

abstract = "The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.",

author = "Zhilei Sun and Evdokimov, {K. E.} and Konishchev, {M. E.} and Kuzmin, {O. S.} and Pichugin, {V. F.}",

year = "2019",

month = aug,

day = "12",

doi = "10.1088/1742-6596/1281/1/012083",

language = "English",

volume = "1281",

journal = "Journal of Physics: Conference Series",

issn = "1742-6588",

publisher = "IOP Publishing Ltd.",

number = "1",

note = "14th International Conference on Films and Coatings, ICFC 2019 ; Conference date: 14-05-2019 Through 16-05-2019",

}

TY - JOUR

T1 - Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering

AU - Sun, Zhilei

AU - Evdokimov, K. E.

AU - Konishchev, M. E.

AU - Kuzmin, O. S.

AU - Pichugin, V. F.

PY - 2019/8/12

Y1 - 2019/8/12

N2 - The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

AB - The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

UR - http://www.scopus.com/inward/record.url?scp=85072213930&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85072213930&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1281/1/012083

DO - 10.1088/1742-6596/1281/1/012083

M3 - Conference article

AN - SCOPUS:85072213930

VL - 1281

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012083

T2 - 14th International Conference on Films and Coatings, ICFC 2019

Y2 - 14 May 2019 through 16 May 2019

ER -