Effect of post annealing on properties of N-doped TiO<sub>2</sub> films deposited by reactive magnetron sputtering

Abstract

The paper studies the effect of annealing on the structure and properties of N-doped TiO₂ films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

Original language	English
Article number	012083
Journal	Journal of Physics: Conference Series
Volume	1281
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/1281/1/012083
Publication status	Published - 12 Aug 2019
Event	14th International Conference on Films and Coatings, ICFC 2019 - Saint Petersburg, Russian Federation Duration: 14 May 2019 → 16 May 2019

ASJC Scopus subject areas

Physics and Astronomy(all)

Access to Document

10.1088/1742-6596/1281/1/012083

Fingerprint Dive into the research topics of 'Effect of post annealing on properties of N-doped TiO<sub>2</sub> films deposited by reactive magnetron sputtering'. Together they form a unique fingerprint.

Cite this

@article{d4603f7742734d2ba7adb8c19969cedd,

title = "Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering",

abstract = "The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.",

author = "Zhilei Sun and Evdokimov, {K. E.} and Konishchev, {M. E.} and Kuzmin, {O. S.} and Pichugin, {V. F.}",

year = "2019",

month = aug,

day = "12",

doi = "10.1088/1742-6596/1281/1/012083",

language = "English",

volume = "1281",

journal = "Journal of Physics: Conference Series",

issn = "1742-6588",

publisher = "IOP Publishing Ltd.",

number = "1",

note = "14th International Conference on Films and Coatings, ICFC 2019 ; Conference date: 14-05-2019 Through 16-05-2019",

}

TY - JOUR

T1 - Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering

AU - Sun, Zhilei

AU - Evdokimov, K. E.

AU - Konishchev, M. E.

AU - Kuzmin, O. S.

AU - Pichugin, V. F.

PY - 2019/8/12

Y1 - 2019/8/12

N2 - The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

AB - The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.

UR - http://www.scopus.com/inward/record.url?scp=85072213930&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85072213930&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1281/1/012083

DO - 10.1088/1742-6596/1281/1/012083

M3 - Conference article

AN - SCOPUS:85072213930

VL - 1281

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012083

T2 - 14th International Conference on Films and Coatings, ICFC 2019

Y2 - 14 May 2019 through 16 May 2019

ER -

Effect of post annealing on properties of N-doped TiO₂ films deposited by reactive magnetron sputtering

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint Dive into the research topics of 'Effect of post annealing on properties of N-doped TiO<sub>2</sub> films deposited by reactive magnetron sputtering'. Together they form a unique fingerprint.

Cite this