Effect of nitrogen-doping and post annealing on wettability and band gap energy of TiO2 thin film

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1 Citation (Scopus)

Abstract

Titanium dioxide film is one of the most promising self-cleaning materials. The self-cleaning performance is directly related to the photocatalytic activity and surface wettability, which, in turn, depends on the TiO2 film structure parameters. Nitrogen-doping and post annealing are commonly used for TiO2 film treatment. The present paper addresses the mechanisms of N-doping and annealing induced TiO2 film structure transition, band gap narrowing and wettability transition. It is shown that N-doping combined with annealing leads to anatase → rutile phase transition, formation of hierarchical topography, change of surface chemical composition, and consequently results in reduction of band gap energy and water contact angle. N-doping level and N-linkages are found to significantly affect the structure/properties of annealed TiO2 and N-doped TiO2 films. The proposed mechanisms might help optimize TiO2 film synthesis and post treatment procedures. Moreover, annealed N-doped TiO2 film with highest N-content, simultaneously exhibiting anatase-rutile polycrystalline structure, high roughness, as well as lowest band gap energy and water contact angle, is supposed to present optimal self-cleaning performance.

Original languageEnglish
Article number144048
JournalApplied Surface Science
Volume500
DOIs
Publication statusPublished - 15 Jan 2020

Fingerprint

wettability
Wetting
Energy gap
Nitrogen
Doping (additives)
Annealing
nitrogen
Thin films
annealing
thin films
Titanium dioxide
cleaning
Cleaning
Electron transitions
anatase
rutile
Contact angle
Water
linkages
titanium oxides

Keywords

  • Band gap narrowing
  • N-doped TiO film
  • Pulsed DC magnetron sputtering
  • Structure evolution
  • Wettability transition

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

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title = "Effect of nitrogen-doping and post annealing on wettability and band gap energy of TiO2 thin film",
abstract = "Titanium dioxide film is one of the most promising self-cleaning materials. The self-cleaning performance is directly related to the photocatalytic activity and surface wettability, which, in turn, depends on the TiO2 film structure parameters. Nitrogen-doping and post annealing are commonly used for TiO2 film treatment. The present paper addresses the mechanisms of N-doping and annealing induced TiO2 film structure transition, band gap narrowing and wettability transition. It is shown that N-doping combined with annealing leads to anatase → rutile phase transition, formation of hierarchical topography, change of surface chemical composition, and consequently results in reduction of band gap energy and water contact angle. N-doping level and N-linkages are found to significantly affect the structure/properties of annealed TiO2 and N-doped TiO2 films. The proposed mechanisms might help optimize TiO2 film synthesis and post treatment procedures. Moreover, annealed N-doped TiO2 film with highest N-content, simultaneously exhibiting anatase-rutile polycrystalline structure, high roughness, as well as lowest band gap energy and water contact angle, is supposed to present optimal self-cleaning performance.",
keywords = "Band gap narrowing, N-doped TiO film, Pulsed DC magnetron sputtering, Structure evolution, Wettability transition",
author = "Zhilei Sun and Pichugin, {V. F.} and Evdokimov, {K. E.} and Konishchev, {M. E.} and Syrtanov, {M. S.} and Kudiiarov, {V. N.} and Ke Li and Tverdokhlebov, {S. I.}",
year = "2020",
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T1 - Effect of nitrogen-doping and post annealing on wettability and band gap energy of TiO2 thin film

AU - Sun, Zhilei

AU - Pichugin, V. F.

AU - Evdokimov, K. E.

AU - Konishchev, M. E.

AU - Syrtanov, M. S.

AU - Kudiiarov, V. N.

AU - Li, Ke

AU - Tverdokhlebov, S. I.

PY - 2020/1/15

Y1 - 2020/1/15

N2 - Titanium dioxide film is one of the most promising self-cleaning materials. The self-cleaning performance is directly related to the photocatalytic activity and surface wettability, which, in turn, depends on the TiO2 film structure parameters. Nitrogen-doping and post annealing are commonly used for TiO2 film treatment. The present paper addresses the mechanisms of N-doping and annealing induced TiO2 film structure transition, band gap narrowing and wettability transition. It is shown that N-doping combined with annealing leads to anatase → rutile phase transition, formation of hierarchical topography, change of surface chemical composition, and consequently results in reduction of band gap energy and water contact angle. N-doping level and N-linkages are found to significantly affect the structure/properties of annealed TiO2 and N-doped TiO2 films. The proposed mechanisms might help optimize TiO2 film synthesis and post treatment procedures. Moreover, annealed N-doped TiO2 film with highest N-content, simultaneously exhibiting anatase-rutile polycrystalline structure, high roughness, as well as lowest band gap energy and water contact angle, is supposed to present optimal self-cleaning performance.

AB - Titanium dioxide film is one of the most promising self-cleaning materials. The self-cleaning performance is directly related to the photocatalytic activity and surface wettability, which, in turn, depends on the TiO2 film structure parameters. Nitrogen-doping and post annealing are commonly used for TiO2 film treatment. The present paper addresses the mechanisms of N-doping and annealing induced TiO2 film structure transition, band gap narrowing and wettability transition. It is shown that N-doping combined with annealing leads to anatase → rutile phase transition, formation of hierarchical topography, change of surface chemical composition, and consequently results in reduction of band gap energy and water contact angle. N-doping level and N-linkages are found to significantly affect the structure/properties of annealed TiO2 and N-doped TiO2 films. The proposed mechanisms might help optimize TiO2 film synthesis and post treatment procedures. Moreover, annealed N-doped TiO2 film with highest N-content, simultaneously exhibiting anatase-rutile polycrystalline structure, high roughness, as well as lowest band gap energy and water contact angle, is supposed to present optimal self-cleaning performance.

KW - Band gap narrowing

KW - N-doped TiO film

KW - Pulsed DC magnetron sputtering

KW - Structure evolution

KW - Wettability transition

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