Abstract
The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.
Original language | English |
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Pages (from-to) | 135-138 |
Number of pages | 4 |
Journal | Vacuum |
Volume | 141 |
DOIs | |
Publication status | Published - 1 Jul 2017 |
Keywords
- High-rate coating deposition
- Liquid-phase target
- Magnetron sputtering systems
ASJC Scopus subject areas
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films