Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

Alena V. Yuryeva, Artyom S. Shabunin, Dmitry V. Korzhenko, Olga S. Korneva, Mikhail V. Nikolaev

The Weinberg Research Center

Research output: Contribution to journal › Article

Abstract

The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm² is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

Original language	English
Pages (from-to)	135-138
Number of pages	4
Journal	Vacuum
Volume	141
DOIs	https://doi.org/10.1016/j.vacuum.2017.04.001
Publication status	Published - 1 Jul 2017

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Keywords

High-rate coating deposition
Liquid-phase target
Magnetron sputtering systems

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

Cite this

Yuryeva, A. V., Shabunin, A. S., Korzhenko, D. V., Korneva, O. S., & Nikolaev, M. V. (2017). Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target. Vacuum, 141, 135-138. https://doi.org/10.1016/j.vacuum.2017.04.001

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AU - Korneva, Olga S.

AU - Nikolaev, Mikhail V.

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AB - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

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KW - Liquid-phase target

KW - Magnetron sputtering systems

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Access to Document

10.1016/j.vacuum.2017.04.001