Abstract
The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.
| Original language | English |
|---|---|
| Pages (from-to) | 135-138 |
| Number of pages | 4 |
| Journal | Vacuum |
| Volume | 141 |
| DOIs | |
| Publication status | Published - 1 Jul 2017 |
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Keywords
- High-rate coating deposition
- Liquid-phase target
- Magnetron sputtering systems
ASJC Scopus subject areas
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films
Cite this
Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target. / Yuryeva, Alena V.; Shabunin, Artyom S.; Korzhenko, Dmitry V.; Korneva, Olga S.; Nikolaev, Mikhail V.
In: Vacuum, Vol. 141, 01.07.2017, p. 135-138.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target
AU - Yuryeva, Alena V.
AU - Shabunin, Artyom S.
AU - Korzhenko, Dmitry V.
AU - Korneva, Olga S.
AU - Nikolaev, Mikhail V.
PY - 2017/7/1
Y1 - 2017/7/1
N2 - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.
AB - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.
KW - High-rate coating deposition
KW - Liquid-phase target
KW - Magnetron sputtering systems
UR - http://www.scopus.com/inward/record.url?scp=85017121098&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85017121098&partnerID=8YFLogxK
U2 - 10.1016/j.vacuum.2017.04.001
DO - 10.1016/j.vacuum.2017.04.001
M3 - Article
VL - 141
SP - 135
EP - 138
JO - Vacuum
JF - Vacuum
SN - 0042-207X
ER -