Abstract
The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures.
| Original language | English |
|---|---|
| Title of host publication | Advanced Materials Research |
| Publisher | Trans Tech Publications Ltd |
| Pages | 721-725 |
| Number of pages | 5 |
| Volume | 1040 |
| ISBN (Print) | 9783038352648 |
| DOIs | |
| Publication status | Published - 2014 |
| Event | International Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 - Tomsk, Russian Federation Duration: 26 Mar 2014 → 28 Mar 2014 |
Publication series
| Name | Advanced Materials Research |
|---|---|
| Volume | 1040 |
| ISSN (Print) | 10226680 |
| ISSN (Electronic) | 16628985 |
Other
| Other | International Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 26.3.14 → 28.3.14 |
Fingerprint
Keywords
- Carbon based films
- Dual magnetron
- Sputtering
ASJC Scopus subject areas
- Engineering(all)
Cite this
Effect of magnetic field configuration of dual magnetron on carbon based films properties. / Yurjev, Yuriy N.; Zaitcev, Danil A.; Sidelev, Dmitrii Vladimirovich; Tupikova, Olga Sergeevna.
Advanced Materials Research. Vol. 1040 Trans Tech Publications Ltd, 2014. p. 721-725 (Advanced Materials Research; Vol. 1040).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Effect of magnetic field configuration of dual magnetron on carbon based films properties
AU - Yurjev, Yuriy N.
AU - Zaitcev, Danil A.
AU - Sidelev, Dmitrii Vladimirovich
AU - Tupikova, Olga Sergeevna
PY - 2014
Y1 - 2014
N2 - The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures.
AB - The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures.
KW - Carbon based films
KW - Dual magnetron
KW - Sputtering
UR - http://www.scopus.com/inward/record.url?scp=84913573623&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84913573623&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.1040.721
DO - 10.4028/www.scientific.net/AMR.1040.721
M3 - Conference contribution
AN - SCOPUS:84913573623
SN - 9783038352648
VL - 1040
T3 - Advanced Materials Research
SP - 721
EP - 725
BT - Advanced Materials Research
PB - Trans Tech Publications Ltd
ER -