Effect of energy on the formation of flexible hard Al-Si-N films prepared by magnetron sputtering

J. Musil, D. Javdošňák, R. Čerstvý, S. Haviar, G. Remnev, V. Uglov

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The article reports on mechanical and optical properties of Al-Si-N films with a low Si content deposited by ac pulsed reactive magnetron sputtering. The effect of the energy delivered in the growing film by bombarding ions on the properties of Al-Si-N films was investigated in detail. It has been found that the Al-Si-N films are crystalline, highly elastic and optically transparent, and exhibit the columnar microstructure and low resistance to cracking when sputtered at low energy and the dense, voids-free microstructure and the enhanced resistance to cracking when sputtered at high energy.

Original languageEnglish
Pages (from-to)43-45
Number of pages3
JournalVacuum
Volume133
DOIs
Publication statusPublished - 1 Nov 2016

Fingerprint

Magnetron sputtering
magnetron sputtering
Microstructure
Reactive sputtering
Film growth
microstructure
energy
low resistance
Optical properties
Ions
Crystalline materials
voids
Mechanical properties
mechanical properties
optical properties
ions

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Effect of energy on the formation of flexible hard Al-Si-N films prepared by magnetron sputtering. / Musil, J.; Javdošňák, D.; Čerstvý, R.; Haviar, S.; Remnev, G.; Uglov, V.

In: Vacuum, Vol. 133, 01.11.2016, p. 43-45.

Research output: Contribution to journalArticle

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