Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Abstract

It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

Original language	English
Pages (from-to)	648-651
Number of pages	4
Journal	Journal of Surface Investigation
Volume	10
Issue number	3
DOIs	https://doi.org/10.1134/S1027451016030265
Publication status	Published - 1 May 2016

Keywords

bias potential
cathodic-arc deposition
titanium nitride
vacuum-arc deposition

ASJC Scopus subject areas

Surfaces, Coatings and Films

Access to Document

10.1134/S1027451016030265

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Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition. / Kashkarov, Egor Borisovich ; Nikitenkov, N. N.; Syrtanov, Maxim Sergeevich; Sutygina, A. N.; Gvozdyakov, D. V.

In: Journal of Surface Investigation, Vol. 10, No. 3, 01.05.2016, p. 648-651.

Research output: Contribution to journal › Article › peer-review

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abstract = "It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.",

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author = "Kashkarov, {Egor Borisovich} and Nikitenkov, {N. N.} and Syrtanov, {Maxim Sergeevich} and Sutygina, {A. N.} and Gvozdyakov, {D. V.}",

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AU - Kashkarov, Egor Borisovich

AU - Nikitenkov, N. N.

AU - Syrtanov, Maxim Sergeevich

AU - Sutygina, A. N.

AU - Gvozdyakov, D. V.

PY - 2016/5/1

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AB - It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

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KW - cathodic-arc deposition

KW - titanium nitride

KW - vacuum-arc deposition

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