Abstract
It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.
| Original language | English |
|---|---|
| Pages (from-to) | 648-651 |
| Number of pages | 4 |
| Journal | Journal of Surface Investigation |
| Volume | 10 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 1 May 2016 |
Keywords
- bias potential
- cathodic-arc deposition
- titanium nitride
- vacuum-arc deposition
ASJC Scopus subject areas
- Surfaces, Coatings and Films
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Kashkarov, E. B., Nikitenkov, N. N., Syrtanov, M. S., Sutygina, A. N., & Gvozdyakov, D. V. (2016). Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition. Journal of Surface Investigation, 10(3), 648-651. https://doi.org/10.1134/S1027451016030265