Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Research output: Contribution to journalArticle

Abstract

It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

Original languageEnglish
Pages (from-to)648-651
Number of pages4
JournalJournal of Surface Investigation
Volume10
Issue number3
DOIs
Publication statusPublished - 1 May 2016

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Titanium nitride
Coatings
Ions
Plasmas
Chemical analysis
titanium nitride

Keywords

  • bias potential
  • cathodic-arc deposition
  • titanium nitride
  • vacuum-arc deposition

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

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title = "Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition",
abstract = "It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.",
keywords = "bias potential, cathodic-arc deposition, titanium nitride, vacuum-arc deposition",
author = "Kashkarov, {Egor Borisovich} and Nikitenkov, {N. N.} and Syrtanov, {Maxim Sergeevich} and Sutygina, {A. N.} and Gvozdyakov, {D. V.}",
year = "2016",
month = "5",
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language = "English",
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pages = "648--651",
journal = "Journal of Surface Investigation",
issn = "1027-4510",
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TY - JOUR

T1 - Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

AU - Kashkarov, Egor Borisovich

AU - Nikitenkov, N. N.

AU - Syrtanov, Maxim Sergeevich

AU - Sutygina, A. N.

AU - Gvozdyakov, D. V.

PY - 2016/5/1

Y1 - 2016/5/1

N2 - It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

AB - It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

KW - bias potential

KW - cathodic-arc deposition

KW - titanium nitride

KW - vacuum-arc deposition

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U2 - 10.1134/S1027451016030265

DO - 10.1134/S1027451016030265

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JF - Journal of Surface Investigation

SN - 1027-4510

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