Abstract
It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.
| Original language | English |
|---|---|
| Pages (from-to) | 648-651 |
| Number of pages | 4 |
| Journal | Journal of Surface Investigation |
| Volume | 10 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 1 May 2016 |
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Keywords
- bias potential
- cathodic-arc deposition
- titanium nitride
- vacuum-arc deposition
ASJC Scopus subject areas
- Surfaces, Coatings and Films
Cite this
Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition. / Kashkarov, Egor Borisovich; Nikitenkov, N. N.; Syrtanov, Maxim Sergeevich; Sutygina, A. N.; Gvozdyakov, D. V.
In: Journal of Surface Investigation, Vol. 10, No. 3, 01.05.2016, p. 648-651.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition
AU - Kashkarov, Egor Borisovich
AU - Nikitenkov, N. N.
AU - Syrtanov, Maxim Sergeevich
AU - Sutygina, A. N.
AU - Gvozdyakov, D. V.
PY - 2016/5/1
Y1 - 2016/5/1
N2 - It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.
AB - It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.
KW - bias potential
KW - cathodic-arc deposition
KW - titanium nitride
KW - vacuum-arc deposition
UR - http://www.scopus.com/inward/record.url?scp=84976271825&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84976271825&partnerID=8YFLogxK
U2 - 10.1134/S1027451016030265
DO - 10.1134/S1027451016030265
M3 - Article
AN - SCOPUS:84976271825
VL - 10
SP - 648
EP - 651
JO - Journal of Surface Investigation
JF - Journal of Surface Investigation
SN - 1027-4510
IS - 3
ER -