Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Research output: Contribution to journalArticle

Abstract

It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

Original languageEnglish
Pages (from-to)648-651
Number of pages4
JournalJournal of Surface Investigation
Volume10
Issue number3
DOIs
Publication statusPublished - 1 May 2016

Keywords

  • bias potential
  • cathodic-arc deposition
  • titanium nitride
  • vacuum-arc deposition

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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