Effect of Al addition on structure and properties of sputtered TiC films

Abstract

The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters Ø_in. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al₂Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.

Original language	English
Journal	Plasma Processes and Polymers
Volume	4
Issue number	SUPPL.1
DOIs	https://doi.org/10.1002/ppap.200730102
Publication status	Published - 1 Dec 2007

Keywords

Al doping
Magnetron sputtering
Mechanical properties
Oxidation resistance
Structure
TiC-Al films

ASJC Scopus subject areas

Condensed Matter Physics
Polymers and Plastics

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10.1002/ppap.200730102

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@article{a124841521514bf182041b7cc61ea8b9,

title = "Effect of Al addition on structure and properties of sputtered TiC films",

abstract = "The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters {\O}in. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al2Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.",

keywords = "Al doping, Magnetron sputtering, Mechanical properties, Oxidation resistance, Structure, TiC-Al films",

author = "Jan Sold{\'a}n and Jindr{\v r}ich Musil and Petr Zeman",

year = "2007",

month = dec,

day = "1",

doi = "10.1002/ppap.200730102",

language = "English",

volume = "4",

journal = "Plasma Processes and Polymers",

issn = "1612-8850",

publisher = "Wiley-VCH Verlag",

number = "SUPPL.1",

}

TY - JOUR

T1 - Effect of Al addition on structure and properties of sputtered TiC films

AU - Soldán, Jan

AU - Musil, Jindrřich

AU - Zeman, Petr

PY - 2007/12/1

Y1 - 2007/12/1

N2 - The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters Øin. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al2Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.

AB - The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters Øin. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al2Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.

KW - Al doping

KW - Magnetron sputtering

KW - Mechanical properties

KW - Oxidation resistance

KW - Structure

KW - TiC-Al films

UR - http://www.scopus.com/inward/record.url?scp=50449083062&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50449083062&partnerID=8YFLogxK

U2 - 10.1002/ppap.200730102

DO - 10.1002/ppap.200730102

M3 - Article

AN - SCOPUS:50449083062

VL - 4

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

SN - 1612-8850

IS - SUPPL.1

ER -