Effect of Al addition on structure and properties of sputtered TiC films

Jan Soldán, Jindrřich Musil, Petr Zeman

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters Øin. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al2Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.

Original languageEnglish
JournalPlasma Processes and Polymers
Volume4
Issue numberSUPPL.1
DOIs
Publication statusPublished - 1 Dec 2007

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oxidation resistance
Oxidation resistance
Crystalline materials
fixing
Microhardness
microhardness
purity
mechanical properties
X rays
Thin films
Mechanical properties
rings
thin films
x rays

Keywords

  • Al doping
  • Magnetron sputtering
  • Mechanical properties
  • Oxidation resistance
  • Structure
  • TiC-Al films

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

Cite this

Effect of Al addition on structure and properties of sputtered TiC films. / Soldán, Jan; Musil, Jindrřich; Zeman, Petr.

In: Plasma Processes and Polymers, Vol. 4, No. SUPPL.1, 01.12.2007.

Research output: Contribution to journalArticle

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