Abstract
The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters Øin. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al2Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.
| Original language | English |
|---|---|
| Journal | Plasma Processes and Polymers |
| Volume | 4 |
| Issue number | SUPPL.1 |
| DOIs | |
| Publication status | Published - 1 Dec 2007 |
Keywords
- Al doping
- Magnetron sputtering
- Mechanical properties
- Oxidation resistance
- Structure
- TiC-Al films
ASJC Scopus subject areas
- Condensed Matter Physics
- Polymers and Plastics
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Soldán, J., Musil, J., & Zeman, P. (2007). Effect of Al addition on structure and properties of sputtered TiC films. Plasma Processes and Polymers, 4(SUPPL.1). https://doi.org/10.1002/ppap.200730102