Abstract
The article reports on the effect of Al addition on the structure, macrostress σ, mechanical properties and oxidation resistance of TiC-Al thin films. These films were sputtered using dc unbalanced magnetron equipped with a TiC target (purity 99.95%) fixed with an Al (99.99%) fixing ring of various inner diameters Øin. It was found that a continuous increase in Al content in the TiC-Al film results in (i) gradual change of the film structure from the crystalline TiC through X-ray amorphous TiC-Al to the crystalline Al2Ti, (ii) decrease in the compressive macrostress (σ<0) up to its conversion to the tensile one (σ>0), (iii) decrease in film microhardness, H and (iv) increase in its oxidation resistance.
Original language | English |
---|---|
Journal | Plasma Processes and Polymers |
Volume | 4 |
Issue number | SUPPL.1 |
DOIs | |
Publication status | Published - 1 Dec 2007 |
Keywords
- Al doping
- Magnetron sputtering
- Mechanical properties
- Oxidation resistance
- Structure
- TiC-Al films
ASJC Scopus subject areas
- Condensed Matter Physics
- Polymers and Plastics