Dynamics of accumulation of implanted hydrogen in beryllium

Division for Experimental Physics

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Abstract

The behaviour of hydrogen implanted in beryllium was investigated based on simulation of the effect of high-temperature plasma and the products of nuclear fusion. The hydrogen depth distribution was measured by the elastic nuclear detection method. The energy of implanted hydrogen ions was 10 keV. the temperature of the samples was either 25 or 400°C, maximum implantation fluence was 10¹⁸ cm^-2. It is shown that the hydrogen diffusion was closely connected with defect motion produced during irradiation.

Original language	English
Pages (from-to)	857-859
Number of pages	3
Journal	Journal of Nuclear Materials
Volume	233-237
Issue number	PART II
DOIs	https://doi.org/10.1016/S0022-3115(96)00057-8
Publication status	Published - 1 Jan 1996

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ASJC Scopus subject areas

Nuclear and High Energy Physics
Nuclear Energy and Engineering
Materials Science(all)

Cite this

Chernov, I. P. (1996). Dynamics of accumulation of implanted hydrogen in beryllium. Journal of Nuclear Materials, 233-237(PART II), 857-859. https://doi.org/10.1016/S0022-3115(96)00057-8

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Access to Document

10.1016/S0022-3115(96)00057-8