Dynamics of accumulation of implanted hydrogen in beryllium

Research output: Contribution to journalArticle

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Abstract

The behaviour of hydrogen implanted in beryllium was investigated based on simulation of the effect of high-temperature plasma and the products of nuclear fusion. The hydrogen depth distribution was measured by the elastic nuclear detection method. The energy of implanted hydrogen ions was 10 keV. the temperature of the samples was either 25 or 400°C, maximum implantation fluence was 1018 cm-2. It is shown that the hydrogen diffusion was closely connected with defect motion produced during irradiation.

Original languageEnglish
Pages (from-to)857-859
Number of pages3
JournalJournal of Nuclear Materials
Volume233-237
Issue numberPART II
DOIs
Publication statusPublished - 1 Jan 1996

Fingerprint

Beryllium
beryllium
Hydrogen
hydrogen
high temperature plasmas
hydrogen ions
nuclear fusion
Protons
implantation
fluence
Fusion reactions
Irradiation
Plasmas
Temperature
Defects
irradiation
defects
products
Ions
simulation

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Materials Science(all)

Cite this

Dynamics of accumulation of implanted hydrogen in beryllium. / Chernov, I. P.

In: Journal of Nuclear Materials, Vol. 233-237, No. PART II, 01.01.1996, p. 857-859.

Research output: Contribution to journalArticle

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