Abstract
Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ∼ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.
| Original language | English |
|---|---|
| Title of host publication | 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings |
| Pages | 37-39 |
| Number of pages | 3 |
| DOIs | |
| Publication status | Published - 2010 |
| Event | 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Altai, Russian Federation Duration: 30 Jun 2010 → 4 Jul 2010 |
Other
| Other | 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 |
|---|---|
| Country | Russian Federation |
| City | Altai |
| Period | 30.6.10 → 4.7.10 |
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Keywords
- Extinction coefficient
- Nickel
- Refractive index
- Spectroscopic ellipsometry
- Surface structure
ASJC Scopus subject areas
- Electrical and Electronic Engineering
Cite this
Dispersive optical parameters of evaporated nickel films. / Atuchin, Victor V.; Grigorieva, Tatiana I.; Kruchinin, Vladimir N.; Lychagin, Dmitry V.; Pokrovsky, Lev D.
2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings. 2010. p. 37-39 5568677.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Dispersive optical parameters of evaporated nickel films
AU - Atuchin, Victor V.
AU - Grigorieva, Tatiana I.
AU - Kruchinin, Vladimir N.
AU - Lychagin, Dmitry V.
AU - Pokrovsky, Lev D.
PY - 2010
Y1 - 2010
N2 - Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ∼ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.
AB - Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ∼ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.
KW - Extinction coefficient
KW - Nickel
KW - Refractive index
KW - Spectroscopic ellipsometry
KW - Surface structure
UR - http://www.scopus.com/inward/record.url?scp=78049412064&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78049412064&partnerID=8YFLogxK
U2 - 10.1109/EDM.2010.5568677
DO - 10.1109/EDM.2010.5568677
M3 - Conference contribution
SN - 9781424466283
SP - 37
EP - 39
BT - 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings
ER -