Dispersive optical parameters of evaporated nickel films

Abstract

Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ∼ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.

Original language	English
Title of host publication	2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings
Pages	37-39
Number of pages	3
DOIs	https://doi.org/10.1109/EDM.2010.5568677
Publication status	Published - 2010
Event	2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Altai, Russian Federation Duration: 30 Jun 2010 → 4 Jul 2010

Other

Other	2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010
Country	Russian Federation
City	Altai
Period	30.6.10 → 4.7.10

Keywords

Extinction coefficient
Nickel
Refractive index
Spectroscopic ellipsometry
Surface structure

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/EDM.2010.5568677

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Atuchin, V. V., Grigorieva, T. I., Kruchinin, V. N., Lychagin, D. V., & Pokrovsky, L. D. (2010). Dispersive optical parameters of evaporated nickel films. In 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings (pp. 37-39). [5568677] https://doi.org/10.1109/EDM.2010.5568677

Dispersive optical parameters of evaporated nickel films. / Atuchin, Victor V.; Grigorieva, Tatiana I.; Kruchinin, Vladimir N.; Lychagin, Dmitry V.; Pokrovsky, Lev D.

2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings. 2010. p. 37-39 5568677.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Atuchin, VV, Grigorieva, TI, Kruchinin, VN, Lychagin, DV & Pokrovsky, LD 2010, Dispersive optical parameters of evaporated nickel films. in 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010 - Proceedings., 5568677, pp. 37-39, 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010, Altai, Russian Federation, 30.6.10. https://doi.org/10.1109/EDM.2010.5568677

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abstract = "Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ∼ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.",

keywords = "Extinction coefficient, Nickel, Refractive index, Spectroscopic ellipsometry, Surface structure",

author = "Atuchin, {Victor V.} and Grigorieva, {Tatiana I.} and Kruchinin, {Vladimir N.} and Lychagin, {Dmitry V.} and Pokrovsky, {Lev D.}",

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AU - Pokrovsky, Lev D.

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AB - Dispersion of refractive index and extinction coefficient of nickel film and nickel crystal surface (100) has been determined with spectroscopic ellipsometry over spectral range λ ∼ 250-1030 nm. Nickel film has been prepared by thermal evaporation method. Nickel crystal has been grown by horizontal Bridgman method. The crystal surface (100) at a first stage was mechanically polished and then treated by electro-polishing to remove the damage layer.

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KW - Refractive index

KW - Spectroscopic ellipsometry

KW - Surface structure

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T2 - 2010 11th Annual International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2010

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