Dislocation structure in near-surface layers of pure metals formed by ion implantation

A. N. Didenko, Alexander Ilyich Ryabchikov, G. P. Isaev, N. M. Arzubov, Yu P. Sharkeev, E. V. Kozlov, G. V. Pushkareva, I. V. Nikonova, A. E. Ligachev

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Abstract

Layer-by-layer investigation of the dislocation structure in near-surface layers of pure metals affected by high-dose ion implantation (D = 1 × 1016- 1 × 1018 ions cm-2, V = 40 kV, 1.2 MV) was carried out using electron microscopy. It was established that implantation of different ions in copper and α-Fe resulted in the formation of a developed dislocation structure in the near-surface layer, the thickness of which exceeded the ion range by several orders of magnitude. The dependences of dislocation density and dislocation loop concentration have been plotted vs. the distance to the irradiated surface.

Original languageEnglish
Pages (from-to)337-341
Number of pages5
JournalMaterials Science and Engineering A
Volume115
Issue numberC
DOIs
Publication statusPublished - 1 Aug 1989

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ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

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