Dislocation structure in coarse-grain copper after ion implantation

Yu P. Sharkeev, N. V. Girsova, E. V. Ryabchikov, O. B. Perevalova, E. V. Kozlov, Ya G. Braun, Kh Yao, S. V. Fortuna

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The results of transmission electron microscopic studies of dislocation structure formed in Ti and Zr ion implanted coarse-grain copper are presented. The long-range effect depends sufficiently on phase formation in the alloying layer. The layer microstructure changes in depth are in correlation with the sample microhardness.

Original languageEnglish
Pages (from-to)14-20
Number of pages7
JournalFizika i Khimiya Obrabotki Materialov
Issue number4
Publication statusPublished - Jul 1996

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Alloying
Ion implantation
Microhardness
Copper
Ions
Microstructure
Electrons

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Sharkeev, Y. P., Girsova, N. V., Ryabchikov, E. V., Perevalova, O. B., Kozlov, E. V., Braun, Y. G., ... Fortuna, S. V. (1996). Dislocation structure in coarse-grain copper after ion implantation. Fizika i Khimiya Obrabotki Materialov, (4), 14-20.

Dislocation structure in coarse-grain copper after ion implantation. / Sharkeev, Yu P.; Girsova, N. V.; Ryabchikov, E. V.; Perevalova, O. B.; Kozlov, E. V.; Braun, Ya G.; Yao, Kh; Fortuna, S. V.

In: Fizika i Khimiya Obrabotki Materialov, No. 4, 07.1996, p. 14-20.

Research output: Contribution to journalArticle

Sharkeev, YP, Girsova, NV, Ryabchikov, EV, Perevalova, OB, Kozlov, EV, Braun, YG, Yao, K & Fortuna, SV 1996, 'Dislocation structure in coarse-grain copper after ion implantation', Fizika i Khimiya Obrabotki Materialov, no. 4, pp. 14-20.
Sharkeev YP, Girsova NV, Ryabchikov EV, Perevalova OB, Kozlov EV, Braun YG et al. Dislocation structure in coarse-grain copper after ion implantation. Fizika i Khimiya Obrabotki Materialov. 1996 Jul;(4):14-20.
Sharkeev, Yu P. ; Girsova, N. V. ; Ryabchikov, E. V. ; Perevalova, O. B. ; Kozlov, E. V. ; Braun, Ya G. ; Yao, Kh ; Fortuna, S. V. / Dislocation structure in coarse-grain copper after ion implantation. In: Fizika i Khimiya Obrabotki Materialov. 1996 ; No. 4. pp. 14-20.
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