Dislocation structure in coarse-grain copper after ion implantation

Yu P. Sharkeev, N. V. Girsova, E. V. Ryabchikov, O. B. Perevalova, E. V. Kozlov, Ya G. Braun, Kh Yao, S. V. Fortuna

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2 Citations (Scopus)

Abstract

The results of transmission electron microscopic studies of dislocation structure formed in Ti and Zr ion implanted coarse-grain copper are presented. The long-range effect depends sufficiently on phase formation in the alloying layer. The layer microstructure changes in depth are in correlation with the sample microhardness.

Original languageEnglish
Pages (from-to)14-20
Number of pages7
JournalFizika i Khimiya Obrabotki Materialov
Issue number4
Publication statusPublished - Jul 1996

ASJC Scopus subject areas

  • Materials Science(all)

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    Sharkeev, Y. P., Girsova, N. V., Ryabchikov, E. V., Perevalova, O. B., Kozlov, E. V., Braun, Y. G., Yao, K., & Fortuna, S. V. (1996). Dislocation structure in coarse-grain copper after ion implantation. Fizika i Khimiya Obrabotki Materialov, (4), 14-20.