Dislocation structure in coarse-grain copper after ion implantation

Yu P. Sharkeev, N. V. Girsova, E. V. Ryabchikov, O. B. Perevalova, E. V. Kozlov, Ya G. Braun, Kh Yao, S. V. Fortuna

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The results of transmission electron microscopic studies of dislocation structure formed in Ti and Zr ion implanted coarse-grain copper are presented. The long-range effect depends sufficiently on phase formation in the alloying layer. The layer microstructure changes in depth are in correlation with the sample microhardness.

Original languageEnglish
Pages (from-to)14-20
Number of pages7
JournalFizika i Khimiya Obrabotki Materialov
Issue number4
Publication statusPublished - Jul 1996

    Fingerprint

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Sharkeev, Y. P., Girsova, N. V., Ryabchikov, E. V., Perevalova, O. B., Kozlov, E. V., Braun, Y. G., ... Fortuna, S. V. (1996). Dislocation structure in coarse-grain copper after ion implantation. Fizika i Khimiya Obrabotki Materialov, (4), 14-20.