Discharge in dual magnetron sputtering system

Jindrich Musil, Pavel Baroch

Research output: Contribution to journalArticle

34 Citations (Scopus)

Abstract

Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.

Original languageEnglish
Pages (from-to)338-339
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume33
Issue number2 I
DOIs
Publication statusPublished - 1 Apr 2005

Keywords

  • Dual magnetron
  • Magnetic field confinement
  • Plasma discharge

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

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