Abstract
Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.
Original language | English |
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Pages (from-to) | 338-339 |
Number of pages | 2 |
Journal | IEEE Transactions on Plasma Science |
Volume | 33 |
Issue number | 2 I |
DOIs | |
Publication status | Published - 1 Apr 2005 |
Keywords
- Dual magnetron
- Magnetic field confinement
- Plasma discharge
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Condensed Matter Physics