Discharge in dual magnetron sputtering system

Abstract

Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.

Original language	English
Pages (from-to)	338-339
Number of pages	2
Journal	IEEE Transactions on Plasma Science
Volume	33
Issue number	2 I
DOIs	https://doi.org/10.1109/TPS.2005.844996
Publication status	Published - 1 Apr 2005

Keywords

Dual magnetron
Magnetic field confinement
Plasma discharge

ASJC Scopus subject areas

Nuclear and High Energy Physics
Condensed Matter Physics

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10.1109/TPS.2005.844996

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@article{6fb5747631294df799e16aa2c5a552a0,

title = "Discharge in dual magnetron sputtering system",

abstract = "Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.",

keywords = "Dual magnetron, Magnetic field confinement, Plasma discharge",

author = "Jindrich Musil and Pavel Baroch",

year = "2005",

month = apr,

day = "1",

doi = "10.1109/TPS.2005.844996",

language = "English",

volume = "33",

pages = "338--339",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "2 I",

}

TY - JOUR

T1 - Discharge in dual magnetron sputtering system

AU - Musil, Jindrich

AU - Baroch, Pavel

PY - 2005/4/1

Y1 - 2005/4/1

N2 - Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.

AB - Dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For efficient deposition process, however, it is very important to optimize electrical and magnetic field of the magnetron. Images of plasma discharges at the different magnetic field configuration of the dual magnetron are presented here.

KW - Dual magnetron

KW - Magnetic field confinement

KW - Plasma discharge

UR - http://www.scopus.com/inward/record.url?scp=18844405177&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=18844405177&partnerID=8YFLogxK

U2 - 10.1109/TPS.2005.844996

DO - 10.1109/TPS.2005.844996

M3 - Article

AN - SCOPUS:18844405177

VL - 33

SP - 338

EP - 339

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

SN - 0093-3813

IS - 2 I