Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production

Kirill Andreevich Kozin, Alexey G. Goryunov, Flavio Manenti, Francesco Rossi, Alexey E. Stolpovskiy

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Traditionally high-grade polycrystalline silicon production is obtained by the Chemical Vapor Deposition (CVD) process in the so-called Siemens reactor. The problem of rod temperature control in such a reactor is broached in this work. An indirect estimation method of the polysilicon rod diameter and the temperature estimation by means of the rod electrical resistance are both proposed. The main issue to overcome is related to the intrinsically unsteady-state conditions of the Siemens reactor (and all the batch reactors as well). From this perspective, the problem of temperature measurement can be solved using the appropriate pyrometer, although the temperature at the center of the rod has still to be estimate numerically. The aim of this paper is to develop a novel adaptive control system for the Siemens reactor based on neuro-fuzzy approach for both the parameter tuning and the control loop itself. A comparative discussion between the proposed method and other advanced control techniques is proposed.

Original languageEnglish
Title of host publicationChemical Engineering Transactions
PublisherItalian Association of Chemical Engineering - AIDIC
Pages1531-1536
Number of pages6
Volume43
ISBN (Print)9788895608341
DOIs
Publication statusPublished - 2015

Publication series

NameChemical Engineering Transactions
Volume43
ISSN (Electronic)22839216

Fingerprint

Polysilicon
Chemical vapor deposition
Control systems
Pyrometers
Adaptive control systems
Acoustic impedance
Batch reactors
Temperature control
Temperature measurement
Tuning
Temperature

ASJC Scopus subject areas

  • Chemical Engineering(all)

Cite this

Kozin, K. A., Goryunov, A. G., Manenti, F., Rossi, F., & Stolpovskiy, A. E. (2015). Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production. In Chemical Engineering Transactions (Vol. 43, pp. 1531-1536). (Chemical Engineering Transactions; Vol. 43). Italian Association of Chemical Engineering - AIDIC. https://doi.org/10.3303/CET1543256

Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production. / Kozin, Kirill Andreevich; Goryunov, Alexey G.; Manenti, Flavio; Rossi, Francesco; Stolpovskiy, Alexey E.

Chemical Engineering Transactions. Vol. 43 Italian Association of Chemical Engineering - AIDIC, 2015. p. 1531-1536 (Chemical Engineering Transactions; Vol. 43).

Research output: Chapter in Book/Report/Conference proceedingChapter

Kozin, KA, Goryunov, AG, Manenti, F, Rossi, F & Stolpovskiy, AE 2015, Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production. in Chemical Engineering Transactions. vol. 43, Chemical Engineering Transactions, vol. 43, Italian Association of Chemical Engineering - AIDIC, pp. 1531-1536. https://doi.org/10.3303/CET1543256
Kozin KA, Goryunov AG, Manenti F, Rossi F, Stolpovskiy AE. Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production. In Chemical Engineering Transactions. Vol. 43. Italian Association of Chemical Engineering - AIDIC. 2015. p. 1531-1536. (Chemical Engineering Transactions). https://doi.org/10.3303/CET1543256
Kozin, Kirill Andreevich ; Goryunov, Alexey G. ; Manenti, Flavio ; Rossi, Francesco ; Stolpovskiy, Alexey E. / Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production. Chemical Engineering Transactions. Vol. 43 Italian Association of Chemical Engineering - AIDIC, 2015. pp. 1531-1536 (Chemical Engineering Transactions).
@inbook{f321d7deff694d219f78e0debed024a6,
title = "Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production",
abstract = "Traditionally high-grade polycrystalline silicon production is obtained by the Chemical Vapor Deposition (CVD) process in the so-called Siemens reactor. The problem of rod temperature control in such a reactor is broached in this work. An indirect estimation method of the polysilicon rod diameter and the temperature estimation by means of the rod electrical resistance are both proposed. The main issue to overcome is related to the intrinsically unsteady-state conditions of the Siemens reactor (and all the batch reactors as well). From this perspective, the problem of temperature measurement can be solved using the appropriate pyrometer, although the temperature at the center of the rod has still to be estimate numerically. The aim of this paper is to develop a novel adaptive control system for the Siemens reactor based on neuro-fuzzy approach for both the parameter tuning and the control loop itself. A comparative discussion between the proposed method and other advanced control techniques is proposed.",
author = "Kozin, {Kirill Andreevich} and Goryunov, {Alexey G.} and Flavio Manenti and Francesco Rossi and Stolpovskiy, {Alexey E.}",
year = "2015",
doi = "10.3303/CET1543256",
language = "English",
isbn = "9788895608341",
volume = "43",
series = "Chemical Engineering Transactions",
publisher = "Italian Association of Chemical Engineering - AIDIC",
pages = "1531--1536",
booktitle = "Chemical Engineering Transactions",

}

TY - CHAP

T1 - Development of an advanced control system for a chemical vapor deposition (CVD) reactor for polysilicon production

AU - Kozin, Kirill Andreevich

AU - Goryunov, Alexey G.

AU - Manenti, Flavio

AU - Rossi, Francesco

AU - Stolpovskiy, Alexey E.

PY - 2015

Y1 - 2015

N2 - Traditionally high-grade polycrystalline silicon production is obtained by the Chemical Vapor Deposition (CVD) process in the so-called Siemens reactor. The problem of rod temperature control in such a reactor is broached in this work. An indirect estimation method of the polysilicon rod diameter and the temperature estimation by means of the rod electrical resistance are both proposed. The main issue to overcome is related to the intrinsically unsteady-state conditions of the Siemens reactor (and all the batch reactors as well). From this perspective, the problem of temperature measurement can be solved using the appropriate pyrometer, although the temperature at the center of the rod has still to be estimate numerically. The aim of this paper is to develop a novel adaptive control system for the Siemens reactor based on neuro-fuzzy approach for both the parameter tuning and the control loop itself. A comparative discussion between the proposed method and other advanced control techniques is proposed.

AB - Traditionally high-grade polycrystalline silicon production is obtained by the Chemical Vapor Deposition (CVD) process in the so-called Siemens reactor. The problem of rod temperature control in such a reactor is broached in this work. An indirect estimation method of the polysilicon rod diameter and the temperature estimation by means of the rod electrical resistance are both proposed. The main issue to overcome is related to the intrinsically unsteady-state conditions of the Siemens reactor (and all the batch reactors as well). From this perspective, the problem of temperature measurement can be solved using the appropriate pyrometer, although the temperature at the center of the rod has still to be estimate numerically. The aim of this paper is to develop a novel adaptive control system for the Siemens reactor based on neuro-fuzzy approach for both the parameter tuning and the control loop itself. A comparative discussion between the proposed method and other advanced control techniques is proposed.

UR - http://www.scopus.com/inward/record.url?scp=84946028884&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84946028884&partnerID=8YFLogxK

U2 - 10.3303/CET1543256

DO - 10.3303/CET1543256

M3 - Chapter

SN - 9788895608341

VL - 43

T3 - Chemical Engineering Transactions

SP - 1531

EP - 1536

BT - Chemical Engineering Transactions

PB - Italian Association of Chemical Engineering - AIDIC

ER -