Abstract
Experiments with a short-circuited load and an aluminum wire array with a varied initial resistance were performed by using a GIT-4 inductivc-energy-storage generator with a plasma opening switch. The dependences Rp(t) for this switch were calculated using a set of statistical data obtained in experiments. The effective resistance of the plasma opening switch (∼1.2 Ω) establishes in 70-100 ns and remains virtually constant for the subsequent time interval of 40-70 ns.
| Original language | English |
|---|---|
| Pages (from-to) | 79-81 |
| Number of pages | 3 |
| Journal | Instruments and Experimental Techniques |
| Volume | 40 |
| Issue number | 1 |
| Publication status | Published - Jan 1997 |
| Externally published | Yes |
Fingerprint
ASJC Scopus subject areas
- Engineering (miscellaneous)
- Instrumentation
Cite this
Determination of the effective resistance of a plasma opening switch. / Shishlov, A. V.
In: Instruments and Experimental Techniques, Vol. 40, No. 1, 01.1997, p. 79-81.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Determination of the effective resistance of a plasma opening switch
AU - Shishlov, A. V.
PY - 1997/1
Y1 - 1997/1
N2 - Experiments with a short-circuited load and an aluminum wire array with a varied initial resistance were performed by using a GIT-4 inductivc-energy-storage generator with a plasma opening switch. The dependences Rp(t) for this switch were calculated using a set of statistical data obtained in experiments. The effective resistance of the plasma opening switch (∼1.2 Ω) establishes in 70-100 ns and remains virtually constant for the subsequent time interval of 40-70 ns.
AB - Experiments with a short-circuited load and an aluminum wire array with a varied initial resistance were performed by using a GIT-4 inductivc-energy-storage generator with a plasma opening switch. The dependences Rp(t) for this switch were calculated using a set of statistical data obtained in experiments. The effective resistance of the plasma opening switch (∼1.2 Ω) establishes in 70-100 ns and remains virtually constant for the subsequent time interval of 40-70 ns.
UR - http://www.scopus.com/inward/record.url?scp=27644442478&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=27644442478&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:27644442478
VL - 40
SP - 79
EP - 81
JO - Instruments and Experimental Techniques
JF - Instruments and Experimental Techniques
SN - 0020-4412
IS - 1
ER -