Deposition of the silicon films from plasma ablation formed by a high power ion beam

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Print)9781479927111
DOIs
Publication statusPublished - 16 Jan 2015
Event41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014 - Washington, United States
Duration: 25 May 201429 May 2014

Other

Other41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014
CountryUnited States
CityWashington
Period25.5.1429.5.14

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

Cite this

Remnev, G. E., Kholodnaya, G. E., Sazonov, R. V., & Ponomarev, DV. (2015). Deposition of the silicon films from plasma ablation formed by a high power ion beam. In ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams [7012575] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PLASMA.2014.7012575

Deposition of the silicon films from plasma ablation formed by a high power ion beam. / Remnev, Gennady E.; Kholodnaya, Galina E.; Sazonov, Roman V.; Ponomarev, Denis Vladimirovich.

ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc., 2015. 7012575.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Remnev, GE, Kholodnaya, GE, Sazonov, RV & Ponomarev, DV 2015, Deposition of the silicon films from plasma ablation formed by a high power ion beam. in ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams., 7012575, Institute of Electrical and Electronics Engineers Inc., 41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014, Washington, United States, 25.5.14. https://doi.org/10.1109/PLASMA.2014.7012575
Remnev GE, Kholodnaya GE, Sazonov RV, Ponomarev DV. Deposition of the silicon films from plasma ablation formed by a high power ion beam. In ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc. 2015. 7012575 https://doi.org/10.1109/PLASMA.2014.7012575
Remnev, Gennady E. ; Kholodnaya, Galina E. ; Sazonov, Roman V. ; Ponomarev, Denis Vladimirovich. / Deposition of the silicon films from plasma ablation formed by a high power ion beam. ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc., 2015.
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