Deposition of the silicon films from plasma ablation formed by a high power ion beam

Gennady E. Remnev, Galina E. Kholodnaya, Roman V. Sazonov, Denis Vladimirovich Ponomarev

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Print)	9781479927111
DOIs	https://doi.org/10.1109/PLASMA.2014.7012575
Publication status	Published - 16 Jan 2015
Event	41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014 - Washington, United States Duration: 25 May 2014 → 29 May 2014

Other

Other	41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014
Country	United States
City	Washington
Period	25.5.14 → 29.5.14

ASJC Scopus subject areas

Nuclear and High Energy Physics
Condensed Matter Physics

Access to Document

10.1109/PLASMA.2014.7012575

Cite this

Remnev, G. E., Kholodnaya, G. E., Sazonov, R. V., & Ponomarev, DV. (2015). Deposition of the silicon films from plasma ablation formed by a high power ion beam. In ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams [7012575] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PLASMA.2014.7012575

Deposition of the silicon films from plasma ablation formed by a high power ion beam. / Remnev, Gennady E.; Kholodnaya, Galina E.; Sazonov, Roman V.; Ponomarev, Denis Vladimirovich.

ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc., 2015. 7012575.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Remnev, GE , Kholodnaya, GE , Sazonov, RV & Ponomarev, DV 2015, Deposition of the silicon films from plasma ablation formed by a high power ion beam. in ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams., 7012575, Institute of Electrical and Electronics Engineers Inc., 41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014, Washington, United States, 25.5.14. https://doi.org/10.1109/PLASMA.2014.7012575

Remnev GE , Kholodnaya GE , Sazonov RV , Ponomarev DV. Deposition of the silicon films from plasma ablation formed by a high power ion beam. In ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc. 2015. 7012575 https://doi.org/10.1109/PLASMA.2014.7012575

Remnev, Gennady E. ; Kholodnaya, Galina E. ; Sazonov, Roman V. ; Ponomarev, Denis Vladimirovich. / Deposition of the silicon films from plasma ablation formed by a high power ion beam. ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc., 2015.

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