Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance 2-3 Ω/□, transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.
|Journal||IOP Conference Series: Materials Science and Engineering|
|Publication status||Published - 2 Aug 2016|
|Event||8th International Scientific Conference on Issues of Physics and Technology in Science, Industry and Medicine - Tomsk, Russian Federation|
Duration: 1 Jun 2016 → 3 Jun 2016
ASJC Scopus subject areas
- Materials Science(all)