Abstract
Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance 2-3 Ω/□, transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.
Original language | English |
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Article number | 012055 |
Journal | IOP Conference Series: Materials Science and Engineering |
Volume | 135 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2 Aug 2016 |
Event | 8th International Scientific Conference on Issues of Physics and Technology in Science, Industry and Medicine - Tomsk, Russian Federation Duration: 1 Jun 2016 → 3 Jun 2016 |
ASJC Scopus subject areas
- Materials Science(all)
- Engineering(all)