Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

Abstract

Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance 2-3 Ω/□, transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.

Original language	English
Article number	012055
Journal	IOP Conference Series: Materials Science and Engineering
Volume	135
Issue number	1
DOIs	https://doi.org/10.1088/1757-899X/135/1/012055
Publication status	Published - 2 Aug 2016
Event	8th International Scientific Conference on Issues of Physics and Technology in Science, Industry and Medicine - Tomsk, Russian Federation Duration: 1 Jun 2016 → 3 Jun 2016

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)

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Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate. / Zhidik, Y. S.; Troyan, P. E.; Baturina, E. V.; Korzhenko, D. V.; Yurjev, Y. N.

In: IOP Conference Series: Materials Science and Engineering, Vol. 135, No. 1, 012055, 02.08.2016.

Research output: Contribution to journal › Conference article › peer-review

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abstract = "Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance 2-3 Ω/□, transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.",

author = "Zhidik, {Y. S.} and Troyan, {P. E.} and Baturina, {E. V.} and Korzhenko, {D. V.} and Yurjev, {Y. N.}",

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AU - Troyan, P. E.

AU - Baturina, E. V.

AU - Korzhenko, D. V.

AU - Yurjev, Y. N.

PY - 2016/8/2

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AB - Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance 2-3 Ω/□, transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.

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Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

Abstract

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