Deposition of polysiloxane coatings by runaway electrons preionized diffuse discharge in nitrogen flow

M. V. Erofeev, M. A. Shulepov, V. S. Ripenko, V. F. Tarasenko

Research output: Contribution to journalConference article

Abstract

A deposition of polysiloxane coating on titanium substrate by means of atmospheric pressure plasma enhanced chemical vapor deposition (PECVD) in a runaway electron preionized diffuse discharge (REP DD) has been investigated. The coating was produced from vapor of hexomethyldisiloxane (HMDSO) diluted in nitrogen at a flow rate of 1 nl/min. After deposition, the mechanical properties of the coatings have been measured by means of a nanoidentation. The maximum nanohardness of the coating with 3 μm thickness was 4.7 GPa. Energy dispersive analysis has shown that the coatings contain a significant content of carbon and titanium (about 52 at. %, 32 at. %, respectively) and a low content of silicon (about 16 at. %). In the FTIR spectrum, high intensity bands corresponding to stretching vibrations of the Si-O-Si, the Si(CH3)x and CH3 groups are observed, that indicates the organic and inorganic coating structure. Carbon free coating can be produced by REP DD plasma treatment of the deposited SiOxCyHz film, when REP DD operated only in nitrogen.

Original languageEnglish
Article number032069
JournalJournal of Physics: Conference Series
Volume1115
Issue number3
DOIs
Publication statusPublished - 27 Nov 2018
Event6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Russian Federation
Duration: 16 Sep 201822 Sep 2018

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polysiloxanes
coatings
nitrogen
inorganic coatings
titanium
carbon
plasma jets
atmospheric pressure
flow velocity
vapor deposition
mechanical properties
vapors
vibration
silicon

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Deposition of polysiloxane coatings by runaway electrons preionized diffuse discharge in nitrogen flow. / Erofeev, M. V.; Shulepov, M. A.; Ripenko, V. S.; Tarasenko, V. F.

In: Journal of Physics: Conference Series, Vol. 1115, No. 3, 032069, 27.11.2018.

Research output: Contribution to journalConference article

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AU - Ripenko, V. S.

AU - Tarasenko, V. F.

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N2 - A deposition of polysiloxane coating on titanium substrate by means of atmospheric pressure plasma enhanced chemical vapor deposition (PECVD) in a runaway electron preionized diffuse discharge (REP DD) has been investigated. The coating was produced from vapor of hexomethyldisiloxane (HMDSO) diluted in nitrogen at a flow rate of 1 nl/min. After deposition, the mechanical properties of the coatings have been measured by means of a nanoidentation. The maximum nanohardness of the coating with 3 μm thickness was 4.7 GPa. Energy dispersive analysis has shown that the coatings contain a significant content of carbon and titanium (about 52 at. %, 32 at. %, respectively) and a low content of silicon (about 16 at. %). In the FTIR spectrum, high intensity bands corresponding to stretching vibrations of the Si-O-Si, the Si(CH3)x and CH3 groups are observed, that indicates the organic and inorganic coating structure. Carbon free coating can be produced by REP DD plasma treatment of the deposited SiOxCyHz film, when REP DD operated only in nitrogen.

AB - A deposition of polysiloxane coating on titanium substrate by means of atmospheric pressure plasma enhanced chemical vapor deposition (PECVD) in a runaway electron preionized diffuse discharge (REP DD) has been investigated. The coating was produced from vapor of hexomethyldisiloxane (HMDSO) diluted in nitrogen at a flow rate of 1 nl/min. After deposition, the mechanical properties of the coatings have been measured by means of a nanoidentation. The maximum nanohardness of the coating with 3 μm thickness was 4.7 GPa. Energy dispersive analysis has shown that the coatings contain a significant content of carbon and titanium (about 52 at. %, 32 at. %, respectively) and a low content of silicon (about 16 at. %). In the FTIR spectrum, high intensity bands corresponding to stretching vibrations of the Si-O-Si, the Si(CH3)x and CH3 groups are observed, that indicates the organic and inorganic coating structure. Carbon free coating can be produced by REP DD plasma treatment of the deposited SiOxCyHz film, when REP DD operated only in nitrogen.

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