Deposition of fullerene films from the ablation plasma generated by high-power ion beams on graphite targets

V. K. Struts, A. V. Petrov, A. I. Ryabchikov, Yury Petrovich Usov

Research output: Contribution to journalArticle

Abstract

A possibility of deposing carbon films with a high content of C60 and C70 fullerenes from an ablation plasma generated as a result of irradiation of graphite targets by pulsed high-power ion beams is shown. The relative contents of the crystalline diamond-like carbon phase, crystalline fullerene phase, and amorphous carbon phase have been determined by X-ray diffraction analysis for different deposition conditions. The nanohardness and Young's modulus of the deposited films and their adhesion to the single-crystal silicon substrate have been measured.

Original languageEnglish
Pages (from-to)944-947
Number of pages4
JournalBulletin of the Russian Academy of Sciences: Physics
Volume72
Issue number7
DOIs
Publication statusPublished - 2008

    Fingerprint

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this