TY - JOUR
T1 - Deposition of cubic tungsten carbide coating on metal substrates at sputtering of electric discharge plasma
AU - Sivkov, A.
AU - Shanenkov, I.
AU - Ivashutenko, A.
AU - Nikitin, D.
AU - Shanenkova, Y.
AU - Rahmatullin, I.
PY - 2019/11/28
Y1 - 2019/11/28
N2 - Hexagonal modifications of tungsten carbide are widely used in various metalworking products and tools. However, the cubic tungsten carbide phase is still poorly understood due to significant difficulties in its synthesis, both in the form of powdered products, and in bulk form. This leads to the impossibility of conducting direct studies of its physical and mechanical properties. This paper shows the opportunity to obtain bulk coatings with a thickness of up to 70 μm, mainly consisting of cubic tungsten carbide using the plasma-dynamic method. The coating formation occurs when spraying the electric discharge tungsten-carbon containing plasma on a metal substrate made of a titanium and aluminum alloy due to the high rate of sputtering and crystallization. This allows synthesizing a stable coating adherent to the substrate based on cubic tungsten carbide with a purity of its yield of at least 85 wt.%.
AB - Hexagonal modifications of tungsten carbide are widely used in various metalworking products and tools. However, the cubic tungsten carbide phase is still poorly understood due to significant difficulties in its synthesis, both in the form of powdered products, and in bulk form. This leads to the impossibility of conducting direct studies of its physical and mechanical properties. This paper shows the opportunity to obtain bulk coatings with a thickness of up to 70 μm, mainly consisting of cubic tungsten carbide using the plasma-dynamic method. The coating formation occurs when spraying the electric discharge tungsten-carbon containing plasma on a metal substrate made of a titanium and aluminum alloy due to the high rate of sputtering and crystallization. This allows synthesizing a stable coating adherent to the substrate based on cubic tungsten carbide with a purity of its yield of at least 85 wt.%.
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U2 - 10.1088/1742-6596/1393/1/012133
DO - 10.1088/1742-6596/1393/1/012133
M3 - Conference article
AN - SCOPUS:85077958057
VL - 1393
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
SN - 1742-6588
IS - 1
M1 - 012133
T2 - 14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019
Y2 - 15 September 2019 through 21 September 2019
ER -