Deposition of Cr films by hot target magnetron sputtering on biased substrates

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4 Citations (Scopus)

Abstract

The Cr films were deposited by hot target magnetron sputtering on grounded and biased substrates. The deposition modes with low and high deposition rates (different by 4 times) were selected. The sublimation of hot Cr target decreased the re-sputtering effect of the growing films under ion bombardment and reduced the losses of deposition rate from 28.7 to 13.4% (for −40 V bias and 1.9 kW discharge power). The calculations of energy flux density on the substrate revealed that the major contribution has a target radiation (56.2…85.5%) and kinetic energy of deposited particles and ions (4.8…34.3%) become a significant only with substrate biasing. The XRD measurements showed cubic structured (110) Cr films with compressive stresses (0.48…0.90 GPa), which is non-dependent from bias voltage for high-rate deposition modes. The Cr films mainly had a columnar structure and columnar width increased from 50 to 450 nm with rise of discharge power (W). The substrate biasing and high deposition rate resulted in the formation of irregular microstructure of the Cr films along their thickness from porous to columnar state. The indentation tests showed the strong dependence of film hardness and toughness (H/E) from W and different behavior of the mechanical properties of the Cr films for the deposition on biased substrates with low and high deposition rates.

Original languageEnglish
Pages (from-to)560-568
Number of pages9
JournalSurface and Coatings Technology
Volume350
DOIs
Publication statusPublished - 25 Sep 2018

Fingerprint

Magnetron sputtering
Deposition rates
magnetron sputtering
Substrates
Sublimation
Film growth
Ion bombardment
Bias voltage
Compressive stress
Indentation
Kinetic energy
Toughness
toughness
Sputtering
indentation
sublimation
Hardness
bombardment
Ions
ions

Keywords

  • Cr film
  • Hot target sputtering
  • Mechanical properties
  • Structure
  • Substrate bias

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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title = "Deposition of Cr films by hot target magnetron sputtering on biased substrates",
abstract = "The Cr films were deposited by hot target magnetron sputtering on grounded and biased substrates. The deposition modes with low and high deposition rates (different by 4 times) were selected. The sublimation of hot Cr target decreased the re-sputtering effect of the growing films under ion bombardment and reduced the losses of deposition rate from 28.7 to 13.4{\%} (for −40 V bias and 1.9 kW discharge power). The calculations of energy flux density on the substrate revealed that the major contribution has a target radiation (56.2…85.5{\%}) and kinetic energy of deposited particles and ions (4.8…34.3{\%}) become a significant only with substrate biasing. The XRD measurements showed cubic structured (110) Cr films with compressive stresses (0.48…0.90 GPa), which is non-dependent from bias voltage for high-rate deposition modes. The Cr films mainly had a columnar structure and columnar width increased from 50 to 450 nm with rise of discharge power (W). The substrate biasing and high deposition rate resulted in the formation of irregular microstructure of the Cr films along their thickness from porous to columnar state. The indentation tests showed the strong dependence of film hardness and toughness (H/E) from W and different behavior of the mechanical properties of the Cr films for the deposition on biased substrates with low and high deposition rates.",
keywords = "Cr film, Hot target sputtering, Mechanical properties, Structure, Substrate bias",
author = "Sidelev, {Dmitrii V.} and Massimiliano Bestetti and Bleykher, {Galina A.} and Krivobokov, {Valery P.} and Grudinin, {Vladislav A.} and Silvia Franz and Antonello Vicenzo and Shanenkova, {Yuliya L.}",
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T1 - Deposition of Cr films by hot target magnetron sputtering on biased substrates

AU - Sidelev, Dmitrii V.

AU - Bestetti, Massimiliano

AU - Bleykher, Galina A.

AU - Krivobokov, Valery P.

AU - Grudinin, Vladislav A.

AU - Franz, Silvia

AU - Vicenzo, Antonello

AU - Shanenkova, Yuliya L.

PY - 2018/9/25

Y1 - 2018/9/25

N2 - The Cr films were deposited by hot target magnetron sputtering on grounded and biased substrates. The deposition modes with low and high deposition rates (different by 4 times) were selected. The sublimation of hot Cr target decreased the re-sputtering effect of the growing films under ion bombardment and reduced the losses of deposition rate from 28.7 to 13.4% (for −40 V bias and 1.9 kW discharge power). The calculations of energy flux density on the substrate revealed that the major contribution has a target radiation (56.2…85.5%) and kinetic energy of deposited particles and ions (4.8…34.3%) become a significant only with substrate biasing. The XRD measurements showed cubic structured (110) Cr films with compressive stresses (0.48…0.90 GPa), which is non-dependent from bias voltage for high-rate deposition modes. The Cr films mainly had a columnar structure and columnar width increased from 50 to 450 nm with rise of discharge power (W). The substrate biasing and high deposition rate resulted in the formation of irregular microstructure of the Cr films along their thickness from porous to columnar state. The indentation tests showed the strong dependence of film hardness and toughness (H/E) from W and different behavior of the mechanical properties of the Cr films for the deposition on biased substrates with low and high deposition rates.

AB - The Cr films were deposited by hot target magnetron sputtering on grounded and biased substrates. The deposition modes with low and high deposition rates (different by 4 times) were selected. The sublimation of hot Cr target decreased the re-sputtering effect of the growing films under ion bombardment and reduced the losses of deposition rate from 28.7 to 13.4% (for −40 V bias and 1.9 kW discharge power). The calculations of energy flux density on the substrate revealed that the major contribution has a target radiation (56.2…85.5%) and kinetic energy of deposited particles and ions (4.8…34.3%) become a significant only with substrate biasing. The XRD measurements showed cubic structured (110) Cr films with compressive stresses (0.48…0.90 GPa), which is non-dependent from bias voltage for high-rate deposition modes. The Cr films mainly had a columnar structure and columnar width increased from 50 to 450 nm with rise of discharge power (W). The substrate biasing and high deposition rate resulted in the formation of irregular microstructure of the Cr films along their thickness from porous to columnar state. The indentation tests showed the strong dependence of film hardness and toughness (H/E) from W and different behavior of the mechanical properties of the Cr films for the deposition on biased substrates with low and high deposition rates.

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