Current quenching phenomenon in the pseudospark discharge

Y. D. Korolev, I. A. Shemyakin, O. B. Frants, K. Frank, O. Bilwatsch, M. Iberler, J. Urban

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The quenching of a high pulsed current is a typical phenomenon for different types of low pressure and vacuum discharges, the pseudospark discharge including. One of the interpretations of this phenomenon is based on the supposition that the quenching is due to magnetic compression of the plasma column, similar to the classical Z-pinch. In this approach the voltage kick during the quenching appears as a result of a sharp increase in inductance of the constricted plasma column. In this paper we are developing another approach according to which the physical reason of the quenching is a sharp increase in the resistance of the gas discharge gap. Correspondingly, the voltage kick is applied directly to the gap, which leads to an enhanced power input in the plasma and results in an increase in the plasma temperature. In most cases the quenching occurs in the stage of the superdense glow discharge in the conditions when the ionization process in the discharge column is not capable of compensating the losses of the charged particles due to their outflow to the electrodes. During the quenching the voltage is applied mainly to the cathode voltage drop region so that a high-energy electron beam is generated. The energy of this electron beam is dissipated inside the hollow cathode and the plasma temperature and the ionization rate increases. This mechanism is justified by the experiments with the pseudospark discharge at a current level of several kA.

    Original languageEnglish
    Title of host publicationIEEE International Conference on Plasma Science
    Publication statusPublished - 2001
    Event28th IEEE International Conference on Plasma Science/ 13th IEEE International Pulsed Power Conference - Las Vegas, NV, United States
    Duration: 17 Jun 200122 Jun 2001

    Other

    Other28th IEEE International Conference on Plasma Science/ 13th IEEE International Pulsed Power Conference
    CountryUnited States
    CityLas Vegas, NV
    Period17.6.0122.6.01

    Fingerprint

    quenching
    plasma temperature
    electric potential
    magnetic compression
    electron beams
    low vacuum
    ionization
    hollow cathodes
    gas discharges
    inductance
    glow discharges
    high energy electrons
    charged particles
    low pressure
    cathodes
    electrodes
    energy

    ASJC Scopus subject areas

    • Condensed Matter Physics

    Cite this

    Korolev, Y. D., Shemyakin, I. A., Frants, O. B., Frank, K., Bilwatsch, O., Iberler, M., & Urban, J. (2001). Current quenching phenomenon in the pseudospark discharge. In IEEE International Conference on Plasma Science

    Current quenching phenomenon in the pseudospark discharge. / Korolev, Y. D.; Shemyakin, I. A.; Frants, O. B.; Frank, K.; Bilwatsch, O.; Iberler, M.; Urban, J.

    IEEE International Conference on Plasma Science. 2001.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Korolev, YD, Shemyakin, IA, Frants, OB, Frank, K, Bilwatsch, O, Iberler, M & Urban, J 2001, Current quenching phenomenon in the pseudospark discharge. in IEEE International Conference on Plasma Science. 28th IEEE International Conference on Plasma Science/ 13th IEEE International Pulsed Power Conference, Las Vegas, NV, United States, 17.6.01.
    Korolev YD, Shemyakin IA, Frants OB, Frank K, Bilwatsch O, Iberler M et al. Current quenching phenomenon in the pseudospark discharge. In IEEE International Conference on Plasma Science. 2001
    Korolev, Y. D. ; Shemyakin, I. A. ; Frants, O. B. ; Frank, K. ; Bilwatsch, O. ; Iberler, M. ; Urban, J. / Current quenching phenomenon in the pseudospark discharge. IEEE International Conference on Plasma Science. 2001.
    @inproceedings{bfdc088c6d30432785f26c4d8a15a344,
    title = "Current quenching phenomenon in the pseudospark discharge",
    abstract = "The quenching of a high pulsed current is a typical phenomenon for different types of low pressure and vacuum discharges, the pseudospark discharge including. One of the interpretations of this phenomenon is based on the supposition that the quenching is due to magnetic compression of the plasma column, similar to the classical Z-pinch. In this approach the voltage kick during the quenching appears as a result of a sharp increase in inductance of the constricted plasma column. In this paper we are developing another approach according to which the physical reason of the quenching is a sharp increase in the resistance of the gas discharge gap. Correspondingly, the voltage kick is applied directly to the gap, which leads to an enhanced power input in the plasma and results in an increase in the plasma temperature. In most cases the quenching occurs in the stage of the superdense glow discharge in the conditions when the ionization process in the discharge column is not capable of compensating the losses of the charged particles due to their outflow to the electrodes. During the quenching the voltage is applied mainly to the cathode voltage drop region so that a high-energy electron beam is generated. The energy of this electron beam is dissipated inside the hollow cathode and the plasma temperature and the ionization rate increases. This mechanism is justified by the experiments with the pseudospark discharge at a current level of several kA.",
    author = "Korolev, {Y. D.} and Shemyakin, {I. A.} and Frants, {O. B.} and K. Frank and O. Bilwatsch and M. Iberler and J. Urban",
    year = "2001",
    language = "English",
    booktitle = "IEEE International Conference on Plasma Science",

    }

    TY - GEN

    T1 - Current quenching phenomenon in the pseudospark discharge

    AU - Korolev, Y. D.

    AU - Shemyakin, I. A.

    AU - Frants, O. B.

    AU - Frank, K.

    AU - Bilwatsch, O.

    AU - Iberler, M.

    AU - Urban, J.

    PY - 2001

    Y1 - 2001

    N2 - The quenching of a high pulsed current is a typical phenomenon for different types of low pressure and vacuum discharges, the pseudospark discharge including. One of the interpretations of this phenomenon is based on the supposition that the quenching is due to magnetic compression of the plasma column, similar to the classical Z-pinch. In this approach the voltage kick during the quenching appears as a result of a sharp increase in inductance of the constricted plasma column. In this paper we are developing another approach according to which the physical reason of the quenching is a sharp increase in the resistance of the gas discharge gap. Correspondingly, the voltage kick is applied directly to the gap, which leads to an enhanced power input in the plasma and results in an increase in the plasma temperature. In most cases the quenching occurs in the stage of the superdense glow discharge in the conditions when the ionization process in the discharge column is not capable of compensating the losses of the charged particles due to their outflow to the electrodes. During the quenching the voltage is applied mainly to the cathode voltage drop region so that a high-energy electron beam is generated. The energy of this electron beam is dissipated inside the hollow cathode and the plasma temperature and the ionization rate increases. This mechanism is justified by the experiments with the pseudospark discharge at a current level of several kA.

    AB - The quenching of a high pulsed current is a typical phenomenon for different types of low pressure and vacuum discharges, the pseudospark discharge including. One of the interpretations of this phenomenon is based on the supposition that the quenching is due to magnetic compression of the plasma column, similar to the classical Z-pinch. In this approach the voltage kick during the quenching appears as a result of a sharp increase in inductance of the constricted plasma column. In this paper we are developing another approach according to which the physical reason of the quenching is a sharp increase in the resistance of the gas discharge gap. Correspondingly, the voltage kick is applied directly to the gap, which leads to an enhanced power input in the plasma and results in an increase in the plasma temperature. In most cases the quenching occurs in the stage of the superdense glow discharge in the conditions when the ionization process in the discharge column is not capable of compensating the losses of the charged particles due to their outflow to the electrodes. During the quenching the voltage is applied mainly to the cathode voltage drop region so that a high-energy electron beam is generated. The energy of this electron beam is dissipated inside the hollow cathode and the plasma temperature and the ionization rate increases. This mechanism is justified by the experiments with the pseudospark discharge at a current level of several kA.

    UR - http://www.scopus.com/inward/record.url?scp=0035177580&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0035177580&partnerID=8YFLogxK

    M3 - Conference contribution

    AN - SCOPUS:0035177580

    BT - IEEE International Conference on Plasma Science

    ER -