Current quenching in the pseudospark discharge and generation of a fast electron beam

Yu D. Korolev, O. B. Frants, V. G. Geyman, R. V. Ivashov, N. V. Landl, I. A. Shemyakin, R. Bischoff, K. Frank, I. Petzenhauser

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    The quenching of a high pulsed current in the pseudospark discharge is accompanied by an inductive voltage kick at the gap and by formation of an electron beam at the discharge axis. The paper deals with the Investigation of this phenomenon. The main idea of the proposed physical mechanism is that the electrons are accelerated In a double electric layer, which forms during the quenching process between the hollow cathode plasma and the near-anode plasma. Interpretation of the experimental data on this basis is presented.

    Original languageEnglish
    Title of host publicationProceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
    Pages287-290
    Number of pages4
    Volume1
    DOIs
    Publication statusPublished - 2004
    EventProceedings - XXIth International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV - Yalta, Ukraine
    Duration: 27 Sep 20041 Oct 2004

    Other

    OtherProceedings - XXIth International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
    CountryUkraine
    CityYalta
    Period27.9.041.10.04

    Keywords

    • Current quenching
    • Fast electron beam
    • Pseudospark discharge
    • Superdense glow discharge

    ASJC Scopus subject areas

    • Engineering(all)

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  • Cite this

    Korolev, Y. D., Frants, O. B., Geyman, V. G., Ivashov, R. V., Landl, N. V., Shemyakin, I. A., Bischoff, R., Frank, K., & Petzenhauser, I. (2004). Current quenching in the pseudospark discharge and generation of a fast electron beam. In Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV (Vol. 1, pp. 287-290). [1E-01] https://doi.org/10.1109/DEIV.2004.1418664