CuO films deposited by superimposed high power impulse and DC magnetron sputtering

Abstract

Copper oxide films have been successfully deposited onto glass, fused quartz and Si(100) substrates by superimposed high power impulse (HIPIMS) and DC reactive magnetron sputtering. The deposition rate, adhesion, structure, wettability and optical properties of the obtained films were compared with those of CuO films deposited by conventional DC sputtering. X-ray diffraction analysis revealed that nanocrystallite size, single phase cupric oxide thin films with monoclinic structure were formed in all deposition modes. However, superimposing the direct current during off-time of HiPIMS pulsing allowed formation of denser film with smooth surface and good optical properties.

Original language	English
Article number	012127
Journal	Journal of Physics: Conference Series
Volume	1393
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/1393/1/012127
Publication status	Published - 28 Nov 2019
Externally published	Yes
Event	14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019 - Tomsk, Russian Federation Duration: 15 Sep 2019 → 21 Sep 2019

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1088/1742-6596/1393/1/012127

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@article{81419937b1cc45a4baf6a1032fd33873,

title = "CuO films deposited by superimposed high power impulse and DC magnetron sputtering",

abstract = "Copper oxide films have been successfully deposited onto glass, fused quartz and Si(100) substrates by superimposed high power impulse (HIPIMS) and DC reactive magnetron sputtering. The deposition rate, adhesion, structure, wettability and optical properties of the obtained films were compared with those of CuO films deposited by conventional DC sputtering. X-ray diffraction analysis revealed that nanocrystallite size, single phase cupric oxide thin films with monoclinic structure were formed in all deposition modes. However, superimposing the direct current during off-time of HiPIMS pulsing allowed formation of denser film with smooth surface and good optical properties.",

author = "Semenov, {V. A.} and Grenadyorov, {A. S.} and Oskirko, {V. O.} and Zakharov, {A. N.} and Rabotkin, {S. V.} and Ionov, {I. V.} and Solovyev, {A. A.}",

note = "Funding Information: This work was supported by RFBR (grant No. 18-32-00179). Publisher Copyright: {\textcopyright} 2019 IOP Publishing Ltd. All rights reserved. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.; 14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019 ; Conference date: 15-09-2019 Through 21-09-2019",

year = "2019",

month = nov,

day = "28",

doi = "10.1088/1742-6596/1393/1/012127",

language = "English",

volume = "1393",

journal = "Journal of Physics: Conference Series",

issn = "1742-6588",

publisher = "IOP Publishing Ltd.",

number = "1",

}

TY - JOUR

T1 - CuO films deposited by superimposed high power impulse and DC magnetron sputtering

AU - Semenov, V. A.

AU - Grenadyorov, A. S.

AU - Oskirko, V. O.

AU - Zakharov, A. N.

AU - Rabotkin, S. V.

AU - Ionov, I. V.

AU - Solovyev, A. A.

N1 - Funding Information: This work was supported by RFBR (grant No. 18-32-00179). Publisher Copyright: © 2019 IOP Publishing Ltd. All rights reserved. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.

PY - 2019/11/28

Y1 - 2019/11/28

N2 - Copper oxide films have been successfully deposited onto glass, fused quartz and Si(100) substrates by superimposed high power impulse (HIPIMS) and DC reactive magnetron sputtering. The deposition rate, adhesion, structure, wettability and optical properties of the obtained films were compared with those of CuO films deposited by conventional DC sputtering. X-ray diffraction analysis revealed that nanocrystallite size, single phase cupric oxide thin films with monoclinic structure were formed in all deposition modes. However, superimposing the direct current during off-time of HiPIMS pulsing allowed formation of denser film with smooth surface and good optical properties.

AB - Copper oxide films have been successfully deposited onto glass, fused quartz and Si(100) substrates by superimposed high power impulse (HIPIMS) and DC reactive magnetron sputtering. The deposition rate, adhesion, structure, wettability and optical properties of the obtained films were compared with those of CuO films deposited by conventional DC sputtering. X-ray diffraction analysis revealed that nanocrystallite size, single phase cupric oxide thin films with monoclinic structure were formed in all deposition modes. However, superimposing the direct current during off-time of HiPIMS pulsing allowed formation of denser film with smooth surface and good optical properties.

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U2 - 10.1088/1742-6596/1393/1/012127

DO - 10.1088/1742-6596/1393/1/012127

M3 - Conference article

AN - SCOPUS:85077963595

VL - 1393

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012127

T2 - 14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019

Y2 - 15 September 2019 through 21 September 2019

ER -