CuO films deposited by superimposed high power impulse and DC magnetron sputtering

V. A. Semenov, A. S. Grenadyorov, V. O. Oskirko, A. N. Zakharov, S. V. Rabotkin, I. V. Ionov, A. A. Solovyev

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

Copper oxide films have been successfully deposited onto glass, fused quartz and Si(100) substrates by superimposed high power impulse (HIPIMS) and DC reactive magnetron sputtering. The deposition rate, adhesion, structure, wettability and optical properties of the obtained films were compared with those of CuO films deposited by conventional DC sputtering. X-ray diffraction analysis revealed that nanocrystallite size, single phase cupric oxide thin films with monoclinic structure were formed in all deposition modes. However, superimposing the direct current during off-time of HiPIMS pulsing allowed formation of denser film with smooth surface and good optical properties.

Original languageEnglish
Article number012127
JournalJournal of Physics: Conference Series
Volume1393
Issue number1
DOIs
Publication statusPublished - 28 Nov 2019
Externally publishedYes
Event14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019 - Tomsk, Russian Federation
Duration: 15 Sep 201921 Sep 2019

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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