Copper sputtering by power ion beam: Structure and phase composition of the target and film

Structure and phase studies of copper target and copper thin films deposited on glass as a result of the action of high-power ion beam (HPIB) on the metal have been carried out using the methods of transmission electron microscopy and optical metallography. Polycrystalline copper of technical grade was used as a target material. It is shown that HPIB parameters and structural state of the target determine the size and density of droplet fraction on the film. It has been established that the treatment of copper target with a high-power ion beam leads to the metal of structure and phase state modification. Formation of particles of cubic graphite with crystal lattice parameter a=0.4279 nm in the target surface layer has been found.