Control of structure in magnetron sputtered thin films

H. Poláková, M. Kubásek, R. Cerstvý, J. Musil

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.

Original languageEnglish
Pages (from-to)201-205
Number of pages5
JournalSurface and Coatings Technology
Volume142-144
DOIs
Publication statusPublished - 1 Jul 2001

Fingerprint

Thin films
thin films
Substrates
interlayers
Film growth
Ion bombardment
ion currents
Current density
bombardment
crystallinity
Ions
Heating
current density
heating
ions
Temperature
temperature
energy

Keywords

  • Energy delivered to the growing film
  • Interlayer
  • Magnetron sputtering
  • Structure

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Control of structure in magnetron sputtered thin films. / Poláková, H.; Kubásek, M.; Cerstvý, R.; Musil, J.

In: Surface and Coatings Technology, Vol. 142-144, 01.07.2001, p. 201-205.

Research output: Contribution to journalArticle

Poláková, H. ; Kubásek, M. ; Cerstvý, R. ; Musil, J. / Control of structure in magnetron sputtered thin films. In: Surface and Coatings Technology. 2001 ; Vol. 142-144. pp. 201-205.
@article{7dca10b84df0402fa72e93cb16b7620c,
title = "Control of structure in magnetron sputtered thin films",
abstract = "The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.",
keywords = "Energy delivered to the growing film, Interlayer, Magnetron sputtering, Structure",
author = "H. Pol{\'a}kov{\'a} and M. Kub{\'a}sek and R. Cerstv{\'y} and J. Musil",
year = "2001",
month = "7",
day = "1",
doi = "10.1016/S0257-8972(01)01252-X",
language = "English",
volume = "142-144",
pages = "201--205",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",

}

TY - JOUR

T1 - Control of structure in magnetron sputtered thin films

AU - Poláková, H.

AU - Kubásek, M.

AU - Cerstvý, R.

AU - Musil, J.

PY - 2001/7/1

Y1 - 2001/7/1

N2 - The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.

AB - The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.

KW - Energy delivered to the growing film

KW - Interlayer

KW - Magnetron sputtering

KW - Structure

UR - http://www.scopus.com/inward/record.url?scp=0035387578&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035387578&partnerID=8YFLogxK

U2 - 10.1016/S0257-8972(01)01252-X

DO - 10.1016/S0257-8972(01)01252-X

M3 - Article

AN - SCOPUS:0035387578

VL - 142-144

SP - 201

EP - 205

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -