Abstract
The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.
| Original language | English |
|---|---|
| Pages (from-to) | 201-205 |
| Number of pages | 5 |
| Journal | Surface and Coatings Technology |
| Volume | 142-144 |
| DOIs | |
| Publication status | Published - 1 Jul 2001 |
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Keywords
- Energy delivered to the growing film
- Interlayer
- Magnetron sputtering
- Structure
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
Cite this
Control of structure in magnetron sputtered thin films. / Poláková, H.; Kubásek, M.; Cerstvý, R.; Musil, J.
In: Surface and Coatings Technology, Vol. 142-144, 01.07.2001, p. 201-205.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Control of structure in magnetron sputtered thin films
AU - Poláková, H.
AU - Kubásek, M.
AU - Cerstvý, R.
AU - Musil, J.
PY - 2001/7/1
Y1 - 2001/7/1
N2 - The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.
AB - The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, Ts, negative substrate bias, Us, and substrate ion current density, is, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.
KW - Energy delivered to the growing film
KW - Interlayer
KW - Magnetron sputtering
KW - Structure
UR - http://www.scopus.com/inward/record.url?scp=0035387578&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035387578&partnerID=8YFLogxK
U2 - 10.1016/S0257-8972(01)01252-X
DO - 10.1016/S0257-8972(01)01252-X
M3 - Article
AN - SCOPUS:0035387578
VL - 142-144
SP - 201
EP - 205
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
ER -