Control of structure in magnetron sputtered thin films

The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films were used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, T_s, negative substrate bias, U_s, and substrate ion current density, i_s, are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.