Control of macrostress σ in reactively sputtered Mo-Al-N films by total gas pressure

J. Šůna, J. Musil, P. Dohnal

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

This article reports on the effect of the energy delivered to a growing film by bombarding ions and fast neutrals on the macrostress σ and the structure of sputtered films. To demonstrate this effect, we selected Mo-Al-N films with a low (≤20 at.%) Al content reactively sputtered using an unbalanced dc magnetron with a target of 100 mm diameter at a high total pressure pT=3Pa, low substrate bias Us=-20V and a high substrate ion current density is=1mA/cm2. The main goal of this study was to show the reduction of σ in films sputtered at high pressures of several Pa. Under the conditions given above approximately 4 μm thick Mo-Al-N films with enhanced hardness H≈35 GPa and a very low (≤-0.5 GPa) macrostress σ were successfully prepared. This result demonstrates that the enhanced hardness H of Mo-Al-N films is not caused by σ but is due to its nanostructure as shown in the XRD patterns of these films. The Mo-Al-N films with enhanced hardness are composed of a mixture of grains of different crystallographic orientations.

Original languageEnglish
Pages (from-to)588-592
Number of pages5
JournalVacuum
Volume80
Issue number6
DOIs
Publication statusPublished - 10 Mar 2006

Fingerprint

gas pressure
Gases
Hardness
hardness
Ions
Film growth
Substrates
Nanostructures
ion currents
Current density
current density
ions

Keywords

  • Enhanced hardness
  • Ion bombardment
  • Macrostress
  • Mo-Al-N films
  • Neutral bombardment
  • Sputtering
  • Structure

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Control of macrostress σ in reactively sputtered Mo-Al-N films by total gas pressure. / Šůna, J.; Musil, J.; Dohnal, P.

In: Vacuum, Vol. 80, No. 6, 10.03.2006, p. 588-592.

Research output: Contribution to journalArticle

Šůna, J. ; Musil, J. ; Dohnal, P. / Control of macrostress σ in reactively sputtered Mo-Al-N films by total gas pressure. In: Vacuum. 2006 ; Vol. 80, No. 6. pp. 588-592.
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