Control of macrostress σ in reactively sputtered Mo-Al-N films by total gas pressure

J. Šůna, J. Musil, P. Dohnal

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


This article reports on the effect of the energy delivered to a growing film by bombarding ions and fast neutrals on the macrostress σ and the structure of sputtered films. To demonstrate this effect, we selected Mo-Al-N films with a low (≤20 at.%) Al content reactively sputtered using an unbalanced dc magnetron with a target of 100 mm diameter at a high total pressure pT=3Pa, low substrate bias Us=-20V and a high substrate ion current density is=1mA/cm2. The main goal of this study was to show the reduction of σ in films sputtered at high pressures of several Pa. Under the conditions given above approximately 4 μm thick Mo-Al-N films with enhanced hardness H≈35 GPa and a very low (≤-0.5 GPa) macrostress σ were successfully prepared. This result demonstrates that the enhanced hardness H of Mo-Al-N films is not caused by σ but is due to its nanostructure as shown in the XRD patterns of these films. The Mo-Al-N films with enhanced hardness are composed of a mixture of grains of different crystallographic orientations.

Original languageEnglish
Pages (from-to)588-592
Number of pages5
Issue number6
Publication statusPublished - 10 Mar 2006


  • Enhanced hardness
  • Ion bombardment
  • Macrostress
  • Mo-Al-N films
  • Neutral bombardment
  • Sputtering
  • Structure

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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