Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering

L. R. Shaginyan, M. Mišina, J. Zemek, J. Musil, F. Regent, V. F. Britun

Research output: Contribution to journalArticle

48 Citations (Scopus)

Abstract

W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, microhardness and residual stress were studied as a function of the partial pressure of nitrogen. Films containing less than 30 at.% nitrogen were composed of a mixture of b.c.c. W and f.c.c. W2N phases, while only the f.c.c. phase, probably WxTi1-xNy, was present in the films with a nitrogen concentration of [N] ≥ 36 at.%. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. This was accompanied by increasing microstrain, while the compressive residual stress remained in the range of 1.3-2.3 GPa. The single-phase W-Ti-N films, with [N] ≥ 36 at.%, exhibited a micro-hardness of approximately 40 GPa and a large compressive stress of, at most, approximately 5.7 GPa at [N] = 40 at.%. The maximum microhardness was found in films that simultaneously possessed: (i) the presence of two crystalline phases; (ii) large microstrain; and (iii) relatively low compressive residual stress.

Original languageEnglish
Pages (from-to)136-147
Number of pages12
JournalThin Solid Films
Volume408
Issue number1-2
DOIs
Publication statusPublished - 3 Apr 2002

Fingerprint

Reactive sputtering
Magnetron sputtering
Microhardness
microhardness
residual stress
Residual stresses
magnetron sputtering
Nitrogen
nitrogen
Chemical analysis
Compressive stress
Argon
Steel
Silicon
Partial pressure
partial pressure
Crystal structure
direct current
argon
steels

Keywords

  • Alloys
  • Hardness
  • Nitrides
  • Sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering. / Shaginyan, L. R.; Mišina, M.; Zemek, J.; Musil, J.; Regent, F.; Britun, V. F.

In: Thin Solid Films, Vol. 408, No. 1-2, 03.04.2002, p. 136-147.

Research output: Contribution to journalArticle

Shaginyan, L. R. ; Mišina, M. ; Zemek, J. ; Musil, J. ; Regent, F. ; Britun, V. F. / Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering. In: Thin Solid Films. 2002 ; Vol. 408, No. 1-2. pp. 136-147.
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