Abstract
W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, microhardness and residual stress were studied as a function of the partial pressure of nitrogen. Films containing less than 30 at.% nitrogen were composed of a mixture of b.c.c. W and f.c.c. W2N phases, while only the f.c.c. phase, probably WxTi1-xNy, was present in the films with a nitrogen concentration of [N] ≥ 36 at.%. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. This was accompanied by increasing microstrain, while the compressive residual stress remained in the range of 1.3-2.3 GPa. The single-phase W-Ti-N films, with [N] ≥ 36 at.%, exhibited a micro-hardness of approximately 40 GPa and a large compressive stress of, at most, approximately 5.7 GPa at [N] = 40 at.%. The maximum microhardness was found in films that simultaneously possessed: (i) the presence of two crystalline phases; (ii) large microstrain; and (iii) relatively low compressive residual stress.
| Original language | English |
|---|---|
| Pages (from-to) | 136-147 |
| Number of pages | 12 |
| Journal | Thin Solid Films |
| Volume | 408 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 3 Apr 2002 |
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Keywords
- Alloys
- Hardness
- Nitrides
- Sputtering
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Cite this
Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering. / Shaginyan, L. R.; Mišina, M.; Zemek, J.; Musil, J.; Regent, F.; Britun, V. F.
In: Thin Solid Films, Vol. 408, No. 1-2, 03.04.2002, p. 136-147.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
AU - Shaginyan, L. R.
AU - Mišina, M.
AU - Zemek, J.
AU - Musil, J.
AU - Regent, F.
AU - Britun, V. F.
PY - 2002/4/3
Y1 - 2002/4/3
N2 - W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, microhardness and residual stress were studied as a function of the partial pressure of nitrogen. Films containing less than 30 at.% nitrogen were composed of a mixture of b.c.c. W and f.c.c. W2N phases, while only the f.c.c. phase, probably WxTi1-xNy, was present in the films with a nitrogen concentration of [N] ≥ 36 at.%. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. This was accompanied by increasing microstrain, while the compressive residual stress remained in the range of 1.3-2.3 GPa. The single-phase W-Ti-N films, with [N] ≥ 36 at.%, exhibited a micro-hardness of approximately 40 GPa and a large compressive stress of, at most, approximately 5.7 GPa at [N] = 40 at.%. The maximum microhardness was found in films that simultaneously possessed: (i) the presence of two crystalline phases; (ii) large microstrain; and (iii) relatively low compressive residual stress.
AB - W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, microhardness and residual stress were studied as a function of the partial pressure of nitrogen. Films containing less than 30 at.% nitrogen were composed of a mixture of b.c.c. W and f.c.c. W2N phases, while only the f.c.c. phase, probably WxTi1-xNy, was present in the films with a nitrogen concentration of [N] ≥ 36 at.%. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. This was accompanied by increasing microstrain, while the compressive residual stress remained in the range of 1.3-2.3 GPa. The single-phase W-Ti-N films, with [N] ≥ 36 at.%, exhibited a micro-hardness of approximately 40 GPa and a large compressive stress of, at most, approximately 5.7 GPa at [N] = 40 at.%. The maximum microhardness was found in films that simultaneously possessed: (i) the presence of two crystalline phases; (ii) large microstrain; and (iii) relatively low compressive residual stress.
KW - Alloys
KW - Hardness
KW - Nitrides
KW - Sputtering
UR - http://www.scopus.com/inward/record.url?scp=0037012544&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0037012544&partnerID=8YFLogxK
U2 - 10.1016/S0040-6090(02)00091-3
DO - 10.1016/S0040-6090(02)00091-3
M3 - Article
AN - SCOPUS:0037012544
VL - 408
SP - 136
EP - 147
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 1-2
ER -