Compact recycled beam source for XRL and EUVL exposure tools

M. A. Piestrup, M. W. Powell, J. T. Cremer, L. W. Lombardo, V. V. Kaplin, A. A. Mihal'chuk, S. R. Uglov, V. N. Zabaev, D. M. Skopik, R. M. Silzer, G. A. Retzlaff

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

Transition and Parametric radiators are proposed as sources for EUVL and XRL. Collimated soft x rays and extreme ultraviolet (EUV) radiation can be generated using electron beams with moderate electron-beam energies, unlike synchrotron radiators, which require energies of greater than 300 MeV. Earlier work focused on using transition radiation in the 0.5-3.0 keV range with electron beam energies between 17-100 MeV for output wavelength around 1.4 nm. However, tunable quasi-monochromatic emission in the EUV as well as x-ray regions can be also obtained using parametric radiators. We propose that a compact betatron be used to recycle the beam through these radiators for higher x-ray efficiency. Experiments using storage rings and simulations using known betatron parameters are presented here that demonstrate the electron beam can be recycled through the thin radiators up to 300 times. With this increase in efficiency, the source output power is expected in the range of 100 mW.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Editors	Y Vladimirsky
Pages	450-463
Number of pages	14
Volume	3331
DOIs	https://doi.org/10.1117/12.309599
Publication status	Published - 1998
Event	Emerging Lithographic Technologies II - Santa Clara, CA, United States Duration: 23 Feb 1998 → 25 Feb 1998

Other

Other	Emerging Lithographic Technologies II
Country	United States
City	Santa Clara, CA
Period	23.2.98 → 25.2.98

Fingerprint

Keywords

Betatrons
Electron accelerators
Step-and-scan
Transition radiation
X-ray lithography

ASJC Scopus subject areas

Electrical and Electronic Engineering
Condensed Matter Physics

Cite this

Piestrup, M. A., Powell, M. W., Cremer, J. T., Lombardo, L. W., Kaplin, V. V., Mihal'chuk, A. A., ... Retzlaff, G. A. (1998). Compact recycled beam source for XRL and EUVL exposure tools. In Y. Vladimirsky (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3331, pp. 450-463) https://doi.org/10.1117/12.309599

Compact recycled beam source for XRL and EUVL exposure tools. / Piestrup, M. A.; Powell, M. W.; Cremer, J. T.; Lombardo, L. W.; Kaplin, V. V.; Mihal'chuk, A. A.; Uglov, S. R.; Zabaev, V. N.; Skopik, D. M.; Silzer, R. M.; Retzlaff, G. A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Y Vladimirsky. Vol. 3331 1998. p. 450-463.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Piestrup, MA, Powell, MW, Cremer, JT, Lombardo, LW, Kaplin, VV, Mihal'chuk, AA, Uglov, SR, Zabaev, VN, Skopik, DM, Silzer, RM & Retzlaff, GA 1998, Compact recycled beam source for XRL and EUVL exposure tools. in Y Vladimirsky (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 3331, pp. 450-463, Emerging Lithographic Technologies II, Santa Clara, CA, United States, 23.2.98. https://doi.org/10.1117/12.309599

Piestrup, M. A. ; Powell, M. W. ; Cremer, J. T. ; Lombardo, L. W. ; Kaplin, V. V. ; Mihal'chuk, A. A. ; Uglov, S. R. ; Zabaev, V. N. ; Skopik, D. M. ; Silzer, R. M. ; Retzlaff, G. A. / Compact recycled beam source for XRL and EUVL exposure tools. Proceedings of SPIE - The International Society for Optical Engineering. editor / Y Vladimirsky. Vol. 3331 1998. pp. 450-463

@inproceedings{8320eac26c2e4b51ace2921779f0b6e8,

title = "Compact recycled beam source for XRL and EUVL exposure tools",

abstract = "Transition and Parametric radiators are proposed as sources for EUVL and XRL. Collimated soft x rays and extreme ultraviolet (EUV) radiation can be generated using electron beams with moderate electron-beam energies, unlike synchrotron radiators, which require energies of greater than 300 MeV. Earlier work focused on using transition radiation in the 0.5-3.0 keV range with electron beam energies between 17-100 MeV for output wavelength around 1.4 nm. However, tunable quasi-monochromatic emission in the EUV as well as x-ray regions can be also obtained using parametric radiators. We propose that a compact betatron be used to recycle the beam through these radiators for higher x-ray efficiency. Experiments using storage rings and simulations using known betatron parameters are presented here that demonstrate the electron beam can be recycled through the thin radiators up to 300 times. With this increase in efficiency, the source output power is expected in the range of 100 mW.",

keywords = "Betatrons, Electron accelerators, Step-and-scan, Transition radiation, X-ray lithography",

author = "Piestrup, {M. A.} and Powell, {M. W.} and Cremer, {J. T.} and Lombardo, {L. W.} and Kaplin, {V. V.} and Mihal'chuk, {A. A.} and Uglov, {S. R.} and Zabaev, {V. N.} and Skopik, {D. M.} and Silzer, {R. M.} and Retzlaff, {G. A.}",

year = "1998",

doi = "10.1117/12.309599",

language = "English",

volume = "3331",

pages = "450--463",

editor = "Y Vladimirsky",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "Emerging Lithographic Technologies II ; Conference date: 23-02-1998 Through 25-02-1998",

}

TY - GEN

T1 - Compact recycled beam source for XRL and EUVL exposure tools

AU - Piestrup, M. A.

AU - Powell, M. W.

AU - Cremer, J. T.

AU - Lombardo, L. W.

AU - Kaplin, V. V.

AU - Mihal'chuk, A. A.

AU - Uglov, S. R.

AU - Zabaev, V. N.

AU - Skopik, D. M.

AU - Silzer, R. M.

AU - Retzlaff, G. A.

PY - 1998

Y1 - 1998

N2 - Transition and Parametric radiators are proposed as sources for EUVL and XRL. Collimated soft x rays and extreme ultraviolet (EUV) radiation can be generated using electron beams with moderate electron-beam energies, unlike synchrotron radiators, which require energies of greater than 300 MeV. Earlier work focused on using transition radiation in the 0.5-3.0 keV range with electron beam energies between 17-100 MeV for output wavelength around 1.4 nm. However, tunable quasi-monochromatic emission in the EUV as well as x-ray regions can be also obtained using parametric radiators. We propose that a compact betatron be used to recycle the beam through these radiators for higher x-ray efficiency. Experiments using storage rings and simulations using known betatron parameters are presented here that demonstrate the electron beam can be recycled through the thin radiators up to 300 times. With this increase in efficiency, the source output power is expected in the range of 100 mW.

AB - Transition and Parametric radiators are proposed as sources for EUVL and XRL. Collimated soft x rays and extreme ultraviolet (EUV) radiation can be generated using electron beams with moderate electron-beam energies, unlike synchrotron radiators, which require energies of greater than 300 MeV. Earlier work focused on using transition radiation in the 0.5-3.0 keV range with electron beam energies between 17-100 MeV for output wavelength around 1.4 nm. However, tunable quasi-monochromatic emission in the EUV as well as x-ray regions can be also obtained using parametric radiators. We propose that a compact betatron be used to recycle the beam through these radiators for higher x-ray efficiency. Experiments using storage rings and simulations using known betatron parameters are presented here that demonstrate the electron beam can be recycled through the thin radiators up to 300 times. With this increase in efficiency, the source output power is expected in the range of 100 mW.

KW - Betatrons

KW - Electron accelerators

KW - Step-and-scan

KW - Transition radiation

KW - X-ray lithography

UR - http://www.scopus.com/inward/record.url?scp=0009307963&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0009307963&partnerID=8YFLogxK

U2 - 10.1117/12.309599

DO - 10.1117/12.309599

M3 - Conference contribution

AN - SCOPUS:0009307963

VL - 3331

SP - 450

EP - 463

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Vladimirsky, Y

T2 - Emerging Lithographic Technologies II

Y2 - 23 February 1998 through 25 February 1998

ER -

Access to Document

10.1117/12.309599