Compact recycled beam source for XRL and EUVL exposure tools

M. A. Piestrup, M. W. Powell, J. T. Cremer, L. W. Lombardo, V. V. Kaplin, A. A. Mihal'chuk, S. R. Uglov, V. N. Zabaev, D. M. Skopik, R. M. Silzer, G. A. Retzlaff

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Transition and Parametric radiators are proposed as sources for EUVL and XRL. Collimated soft x rays and extreme ultraviolet (EUV) radiation can be generated using electron beams with moderate electron-beam energies, unlike synchrotron radiators, which require energies of greater than 300 MeV. Earlier work focused on using transition radiation in the 0.5-3.0 keV range with electron beam energies between 17-100 MeV for output wavelength around 1.4 nm. However, tunable quasi-monochromatic emission in the EUV as well as x-ray regions can be also obtained using parametric radiators. We propose that a compact betatron be used to recycle the beam through these radiators for higher x-ray efficiency. Experiments using storage rings and simulations using known betatron parameters are presented here that demonstrate the electron beam can be recycled through the thin radiators up to 300 times. With this increase in efficiency, the source output power is expected in the range of 100 mW.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsY Vladimirsky
Pages450-463
Number of pages14
Volume3331
DOIs
Publication statusPublished - 1998
EventEmerging Lithographic Technologies II - Santa Clara, CA, United States
Duration: 23 Feb 199825 Feb 1998

Other

OtherEmerging Lithographic Technologies II
CountryUnited States
CitySanta Clara, CA
Period23.2.9825.2.98

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Keywords

  • Betatrons
  • Electron accelerators
  • Step-and-scan
  • Transition radiation
  • X-ray lithography

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Piestrup, M. A., Powell, M. W., Cremer, J. T., Lombardo, L. W., Kaplin, V. V., Mihal'chuk, A. A., ... Retzlaff, G. A. (1998). Compact recycled beam source for XRL and EUVL exposure tools. In Y. Vladimirsky (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3331, pp. 450-463) https://doi.org/10.1117/12.309599