Chromium films deposition by hot target high power pulsed magnetron sputtering

Deposition conditions and film properties

Research output: Contribution to journalArticle

Abstract

This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500 Hz, duty cycle 4% in the range of averaged power from 15 to 40 W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10 μm, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target.

Original languageEnglish
Pages (from-to)352-362
Number of pages11
JournalSurface and Coatings Technology
Volume375
DOIs
Publication statusPublished - 15 Oct 2019

Fingerprint

Chromium
Magnetron sputtering
chromium
magnetron sputtering
Sublimation
Substrates
Deposition rates
Ionization
Structural properties
Elastic moduli
Surface roughness
Hardness
sublimation
Fluxes
Heating
Mechanical properties
modulus of elasticity
surface roughness
hardness
mechanical properties

Keywords

  • Cr films and coatings
  • Film growth
  • High power pulsed magnetron sputtering (HPPMS)
  • Hot target
  • Sublimation

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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title = "Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties",
abstract = "This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500 Hz, duty cycle 4{\%} in the range of averaged power from 15 to 40 W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10 μm, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target.",
keywords = "Cr films and coatings, Film growth, High power pulsed magnetron sputtering (HPPMS), Hot target, Sublimation",
author = "Grudinin, {Vladislav A.} and Bleykher, {Galina A.} and Sidelev, {Dmitrii V.} and Krivobokov, {Valery P.} and Massimiliano Bestetti and Antonello Vicenzo and Silvia Franz",
year = "2019",
month = "10",
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doi = "10.1016/j.surfcoat.2019.07.025",
language = "English",
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publisher = "Elsevier",

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TY - JOUR

T1 - Chromium films deposition by hot target high power pulsed magnetron sputtering

T2 - Deposition conditions and film properties

AU - Grudinin, Vladislav A.

AU - Bleykher, Galina A.

AU - Sidelev, Dmitrii V.

AU - Krivobokov, Valery P.

AU - Bestetti, Massimiliano

AU - Vicenzo, Antonello

AU - Franz, Silvia

PY - 2019/10/15

Y1 - 2019/10/15

N2 - This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500 Hz, duty cycle 4% in the range of averaged power from 15 to 40 W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10 μm, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target.

AB - This study focuses on the deposition conditions, structural and mechanical properties of Cr films obtained by magnetron sputtering with hot target, and using high power pulsed supply with pre-ionization (pulse frequency 500 Hz, duty cycle 4% in the range of averaged power from 15 to 40 W/cm2). It has been found that hot target leads to a tenfold increase in the energy flux to the substrate compared to magnetron sputtering with cooled target. Intense sublimation from the target allows increasing the deposition rate of Cr films of about an order of magnitude. Moreover, the increase in the magnetron power may be accompanied by less heating of the substrates when depositing films of the same thickness. High power pulsed magnetron sputtering (HPPMS) with sublimating Cr hot target can be characterized by a combined mode in the film structure formation, leading to the formation of pores at the initial stage of growth. Cr films with a thickness of about 10 μm, obtained using a hot target, have lower surface roughness, hardness, and Young's modulus compared with sputtered Cr from a cooled target.

KW - Cr films and coatings

KW - Film growth

KW - High power pulsed magnetron sputtering (HPPMS)

KW - Hot target

KW - Sublimation

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