Characterization of ternary C-Si-Al nanocomposite thin films obtained by TVA method

C. Porosnicu, C. P. Lungu, I. Jepu, O. G. Pompilian, P. Dinca, C. Luculescu, G. Prodan, A. Marin, A. Vladescu, R. Vladoiu

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


Thin film depositions on certain substrates can improve or diminish the physical-chemical behavior of the coated material. For the present work there were used three basic elements: C, Si and Al as coating materials on glass, silicon and OLC45 steel substrates. The purpose of the research is to obtain an optimum combination for properties' improvement, as hardness, adherence and low friction. Nevertheless, such special characteristics can be found likely in a composite material. Ternary C-Si-Al samples of 1 micron thickness were successfully obtained for the first time using Thermionic Vacuum Arc (TVA) deposition method. Depth profile measurements confirmed both the thickness of the obtained layer and the high roughness of the layers deposited on OLC 45 steel substrate. The granular structure of the films was pointed out by SEM, AFM and TEM measurements. XPS measurements highlighted the formation of aluminum and silicon oxides due to the layer exposure to the residual gas existent in the deposition chamber. The friction coefficient of the coatings was two or three times lower in comparison with the one of the uncoated substrates. Film hardness was found to be high with values between 3600 and 5000N/mm2 (~3.6-5.0 GPa), depending on the penetration depth.

Original languageEnglish
Pages (from-to)765-775
Number of pages11
JournalDigest Journal of Nanomaterials and Biostructures
Issue number2
Publication statusPublished - 1 Jan 2014
Externally publishedYes


  • Carbon nanocomposites
  • Coating materials
  • Dry sliding
  • Low-friction
  • TVA

ASJC Scopus subject areas

  • Structural Biology
  • Atomic and Molecular Physics, and Optics
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics
  • Physical and Theoretical Chemistry

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