Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.

Original languageEnglish
Title of host publicationIOP Conference Series: Materials Science and Engineering
PublisherInstitute of Physics Publishing
Volume81
Edition1
DOIs
Publication statusPublished - 23 Apr 2015
EventInternational Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014 - Tomsk, Russian Federation
Duration: 3 Nov 20148 Nov 2014

Conference

ConferenceInternational Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014
CountryRussian Federation
CityTomsk
Period3.11.148.11.14

Fingerprint

Argon
Magnetron sputtering
Ion beams
Aluminum
Defects
Microstructure
Crystallites
X ray diffraction analysis
Microscopes
Optical properties
Crystal structure
Ions
Transmission electron microscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

Cite this

Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. / Umnov, Sergey Pavlovich; Asainov, Oleg Khaidarovich.

IOP Conference Series: Materials Science and Engineering. Vol. 81 1. ed. Institute of Physics Publishing, 2015. 012001.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Umnov, SP & Asainov, OK 2015, Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. in IOP Conference Series: Materials Science and Engineering. 1 edn, vol. 81, 012001, Institute of Physics Publishing, International Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014, Tomsk, Russian Federation, 3.11.14. https://doi.org/10.1088/1757-899X/81/1/012001
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AB - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.

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