Abstract
Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.
| Original language | English |
|---|---|
| Title of host publication | IOP Conference Series: Materials Science and Engineering |
| Publisher | Institute of Physics Publishing |
| Volume | 81 |
| Edition | 1 |
| DOIs | |
| Publication status | Published - 23 Apr 2015 |
| Event | International Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014 - Tomsk, Russian Federation Duration: 3 Nov 2014 → 8 Nov 2014 |
Conference
| Conference | International Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 3.11.14 → 8.11.14 |
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ASJC Scopus subject areas
- Engineering(all)
- Materials Science(all)
Cite this
Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. / Umnov, Sergey Pavlovich; Asainov, Oleg Khaidarovich.
IOP Conference Series: Materials Science and Engineering. Vol. 81 1. ed. Institute of Physics Publishing, 2015. 012001.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam
AU - Umnov, Sergey Pavlovich
AU - Asainov, Oleg Khaidarovich
PY - 2015/4/23
Y1 - 2015/4/23
N2 - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.
AB - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.
UR - http://www.scopus.com/inward/record.url?scp=84930444566&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84930444566&partnerID=8YFLogxK
U2 - 10.1088/1757-899X/81/1/012001
DO - 10.1088/1757-899X/81/1/012001
M3 - Conference contribution
VL - 81
BT - IOP Conference Series: Materials Science and Engineering
PB - Institute of Physics Publishing
ER -