Abstract
The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.
| Original language | English |
|---|---|
| Title of host publication | AIP Conference Proceedings |
| Publisher | American Institute of Physics Inc. |
| Pages | 419-422 |
| Number of pages | 4 |
| Volume | 1623 |
| ISBN (Print) | 9780735412606 |
| DOIs | |
| Publication status | Published - 2014 |
| Event | International Conference on Physical Mesomechanics of Multilevel Systems 2014 - Tomsk, Russian Federation Duration: 3 Sep 2014 → 5 Sep 2014 |
Other
| Other | International Conference on Physical Mesomechanics of Multilevel Systems 2014 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 3.9.14 → 5.9.14 |
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Keywords
- Cellular automata
- Magnetron
- Microcrystalline structure
- Plasma
- Simulation
ASJC Scopus subject areas
- Physics and Astronomy(all)
Cite this
Cellular automata modeling of microcrystalline structure formation. / Mikolaychuk, Mikhail; Knyazeva, Anna.
AIP Conference Proceedings. Vol. 1623 American Institute of Physics Inc., 2014. p. 419-422.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Cellular automata modeling of microcrystalline structure formation
AU - Mikolaychuk, Mikhail
AU - Knyazeva, Anna
PY - 2014
Y1 - 2014
N2 - The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.
AB - The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.
KW - Cellular automata
KW - Magnetron
KW - Microcrystalline structure
KW - Plasma
KW - Simulation
UR - http://www.scopus.com/inward/record.url?scp=84915748347&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84915748347&partnerID=8YFLogxK
U2 - 10.1063/1.4898971
DO - 10.1063/1.4898971
M3 - Conference contribution
AN - SCOPUS:84915748347
SN - 9780735412606
VL - 1623
SP - 419
EP - 422
BT - AIP Conference Proceedings
PB - American Institute of Physics Inc.
ER -