Abstract
The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.
| Original language | English |
|---|---|
| Title of host publication | AIP Conference Proceedings |
| Publisher | American Institute of Physics Inc. |
| Pages | 419-422 |
| Number of pages | 4 |
| Volume | 1623 |
| ISBN (Print) | 9780735412606 |
| DOIs | |
| Publication status | Published - 2014 |
| Event | International Conference on Physical Mesomechanics of Multilevel Systems 2014 - Tomsk, Russian Federation Duration: 3 Sep 2014 → 5 Sep 2014 |
Other
| Other | International Conference on Physical Mesomechanics of Multilevel Systems 2014 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 3.9.14 → 5.9.14 |
Keywords
- Cellular automata
- Magnetron
- Microcrystalline structure
- Plasma
- Simulation
ASJC Scopus subject areas
- Physics and Astronomy(all)
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Cite this
Mikolaychuk, M., & Knyazeva, A. (2014). Cellular automata modeling of microcrystalline structure formation. In AIP Conference Proceedings (Vol. 1623, pp. 419-422). American Institute of Physics Inc.. https://doi.org/10.1063/1.4898971