Abstract
The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.
Original language | English |
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Title of host publication | AIP Conference Proceedings |
Publisher | American Institute of Physics Inc. |
Pages | 419-422 |
Number of pages | 4 |
Volume | 1623 |
ISBN (Print) | 9780735412606 |
DOIs | |
Publication status | Published - 2014 |
Event | International Conference on Physical Mesomechanics of Multilevel Systems 2014 - Tomsk, Russian Federation Duration: 3 Sep 2014 → 5 Sep 2014 |
Other
Other | International Conference on Physical Mesomechanics of Multilevel Systems 2014 |
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Country | Russian Federation |
City | Tomsk |
Period | 3.9.14 → 5.9.14 |
Keywords
- Cellular automata
- Magnetron
- Microcrystalline structure
- Plasma
- Simulation
ASJC Scopus subject areas
- Physics and Astronomy(all)