Cellular automata modeling of microcrystalline structure formation

Mikhail Mikolaychuk, Anna Knyazeva

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.

Original languageEnglish
Title of host publicationAIP Conference Proceedings
PublisherAmerican Institute of Physics Inc.
Pages419-422
Number of pages4
Volume1623
ISBN (Print)9780735412606
DOIs
Publication statusPublished - 2014
EventInternational Conference on Physical Mesomechanics of Multilevel Systems 2014 - Tomsk, Russian Federation
Duration: 3 Sep 20145 Sep 2014

Other

OtherInternational Conference on Physical Mesomechanics of Multilevel Systems 2014
CountryRussian Federation
CityTomsk
Period3.9.145.9.14

Fingerprint

cellular automata
magnetron sputtering
reaction kinetics
coatings
evaluation
kinetics

Keywords

  • Cellular automata
  • Magnetron
  • Microcrystalline structure
  • Plasma
  • Simulation

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Mikolaychuk, M., & Knyazeva, A. (2014). Cellular automata modeling of microcrystalline structure formation. In AIP Conference Proceedings (Vol. 1623, pp. 419-422). American Institute of Physics Inc.. https://doi.org/10.1063/1.4898971

Cellular automata modeling of microcrystalline structure formation. / Mikolaychuk, Mikhail; Knyazeva, Anna.

AIP Conference Proceedings. Vol. 1623 American Institute of Physics Inc., 2014. p. 419-422.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Mikolaychuk, M & Knyazeva, A 2014, Cellular automata modeling of microcrystalline structure formation. in AIP Conference Proceedings. vol. 1623, American Institute of Physics Inc., pp. 419-422, International Conference on Physical Mesomechanics of Multilevel Systems 2014, Tomsk, Russian Federation, 3.9.14. https://doi.org/10.1063/1.4898971
Mikolaychuk M, Knyazeva A. Cellular automata modeling of microcrystalline structure formation. In AIP Conference Proceedings. Vol. 1623. American Institute of Physics Inc. 2014. p. 419-422 https://doi.org/10.1063/1.4898971
Mikolaychuk, Mikhail ; Knyazeva, Anna. / Cellular automata modeling of microcrystalline structure formation. AIP Conference Proceedings. Vol. 1623 American Institute of Physics Inc., 2014. pp. 419-422
@inproceedings{b4161b4714c746cd89de41f10ec948e9,
title = "Cellular automata modeling of microcrystalline structure formation",
abstract = "The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.",
keywords = "Cellular automata, Magnetron, Microcrystalline structure, Plasma, Simulation",
author = "Mikhail Mikolaychuk and Anna Knyazeva",
year = "2014",
doi = "10.1063/1.4898971",
language = "English",
isbn = "9780735412606",
volume = "1623",
pages = "419--422",
booktitle = "AIP Conference Proceedings",
publisher = "American Institute of Physics Inc.",

}

TY - GEN

T1 - Cellular automata modeling of microcrystalline structure formation

AU - Mikolaychuk, Mikhail

AU - Knyazeva, Anna

PY - 2014

Y1 - 2014

N2 - The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.

AB - The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.

KW - Cellular automata

KW - Magnetron

KW - Microcrystalline structure

KW - Plasma

KW - Simulation

UR - http://www.scopus.com/inward/record.url?scp=84915748347&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84915748347&partnerID=8YFLogxK

U2 - 10.1063/1.4898971

DO - 10.1063/1.4898971

M3 - Conference contribution

SN - 9780735412606

VL - 1623

SP - 419

EP - 422

BT - AIP Conference Proceedings

PB - American Institute of Physics Inc.

ER -