Carbon film deposition by powerful ion beams

A. I. Ryabchikov, A. V. Petrov, N. M. Polkovnikova, V. K. Struts, Yury Petrovich Usov, V. P. Arfyev

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Carbonaceous thin films can be used in microelectronics, superconductors, solar batteries, logic and memory devices, and to increase processing tool wear resistance, and as magnetic nanocomposite materials for information storage. This paper presents a study of carbonaceous thin films deposited on silicon substrates using ablation plasma generated by pulsed power ion beams (H+-60%, C+-40%, E = 500 keV, τ = 100 ns, density = 8 J/cm2) on graphitic targets. The concentrations of sp3-bonded crystalline diamond, and amorphous and crystalline phases of carbon were determined by X-ray diffraction analysis (XRD). It was observed that the concentration of the crystalline diamond phase in films deposited under various conditions did not exceed 5%. A substantial concentration (30-95%) of the carbon crystalline phase is in the form of C60 and C70 fullerenes. It is shown that the concentration of fullerenes and the ratio between the relative amounts of C60 and C70 greatly depends on the graphitic target density, carbon film deposition conditions and above all on the distance from the graphitic target to the silicon substrate. This distance determines the film deposition rate and the degree of cooling of the plasma generated on the substrate, which can cause changes in film crystallization conditions.

Original languageEnglish
Pages (from-to)8499-8502
Number of pages4
JournalSurface and Coatings Technology
Volume201
Issue number19-20 SPEC. ISS.
DOIs
Publication statusPublished - 5 Aug 2007

Fingerprint

Carbon films
Ion beams
ion beams
Crystalline materials
Diamond
carbon
Silicon
Fullerenes
fullerenes
Diamonds
Substrates
Carbon
diamonds
Plasmas
Data storage equipment
Thin films
Logic devices
Magnetic materials
silicon
thin films

Keywords

  • Carbonaceous film
  • Film deposition
  • Fullerene
  • Ion beam

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Ryabchikov, A. I., Petrov, A. V., Polkovnikova, N. M., Struts, V. K., Usov, YP., & Arfyev, V. P. (2007). Carbon film deposition by powerful ion beams. Surface and Coatings Technology, 201(19-20 SPEC. ISS.), 8499-8502. https://doi.org/10.1016/j.surfcoat.2006.11.045

Carbon film deposition by powerful ion beams. / Ryabchikov, A. I.; Petrov, A. V.; Polkovnikova, N. M.; Struts, V. K.; Usov, Yury Petrovich; Arfyev, V. P.

In: Surface and Coatings Technology, Vol. 201, No. 19-20 SPEC. ISS., 05.08.2007, p. 8499-8502.

Research output: Contribution to journalArticle

Ryabchikov, AI, Petrov, AV, Polkovnikova, NM, Struts, VK, Usov, YP & Arfyev, VP 2007, 'Carbon film deposition by powerful ion beams', Surface and Coatings Technology, vol. 201, no. 19-20 SPEC. ISS., pp. 8499-8502. https://doi.org/10.1016/j.surfcoat.2006.11.045
Ryabchikov AI, Petrov AV, Polkovnikova NM, Struts VK, Usov YP, Arfyev VP. Carbon film deposition by powerful ion beams. Surface and Coatings Technology. 2007 Aug 5;201(19-20 SPEC. ISS.):8499-8502. https://doi.org/10.1016/j.surfcoat.2006.11.045
Ryabchikov, A. I. ; Petrov, A. V. ; Polkovnikova, N. M. ; Struts, V. K. ; Usov, Yury Petrovich ; Arfyev, V. P. / Carbon film deposition by powerful ion beams. In: Surface and Coatings Technology. 2007 ; Vol. 201, No. 19-20 SPEC. ISS. pp. 8499-8502.
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