Calcium phosphate coating deposition by radio frequency magnetron sputtering in the various inert gases: The pilot study

A. Y. Fedotkin, E. N. Bolbasov, A. I. Kozelskaya, G. Dubinenko, E. V. Shesterikov, A. Ashrafov, S. I. Tverdokhlebov

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Abstract

In this study, thin calcium phosphate coatings were deposited on titanium substrates by radio frequency magnetron sputtering of hydroxyapatite target in the neon (Ne), argon (Ar), krypton (Kr) and xenon (Xe). The influence of the working gas (Ne, Ar, Kr and Xe) on the deposition rate, surface morphology, indentation hardness, Young's modulus and adhesion of the coatings was investigated. It was found that the calcium phosphate (CaP) coatings formed in Ar and Kr have a similar deposition rate. With an increase in the atomic weight of the working gas, the crystallite size of the coatings increases. The coatings deposited in Ne and Xe have a higher Ca/P ratio than the coatings formed in Ar and Kr. The coatings obtained in Ne, Ar and Xe had approximately similar values of nanohardness and Young's modulus. The CaP coatings deposited in Xe are characterized by better adhesion.

Original languageEnglish
Article number121735
JournalMaterials Chemistry and Physics
Volume235
DOIs
Publication statusPublished - 1 Sep 2019

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Keywords

  • Biomaterials
  • Deposition
  • Hydroxyapatite
  • Magnetron sputtering
  • Thin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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