Blister formation in ZrN/SiN multilayers after He irradiation

V. V. Uglov, G. Abadias, S. V. Zlotski, N. T. Kvasov, I. A. Saladukhin, A. A. Malashevih

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The work is dedicated to the investigation of blister formation in ZrN/SiNx multilayer films irradiated with He ions (30 keV) and annealed in a vacuum at 600 °C. Multilayer films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. ZrN/SiNx films were deposited by sequential sputtering from elemental Zr and Si3N4 targets at substrate temperature of 300 °C, with ZrN and SiNx layer thickness varying from 2 to 10 nm. According to transmission electron microscopy (TEM), the multilayer films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. Surface morphology changes of ZrN/SiNx films irradiated with He ions (30 keV) and annealed in a vacuum at 600 °C were studied by scanning electron (SEM) and atomic-force microscopy (AFM) methods. It has been found that under He ions (30 keV) irradiation ZrN/SiNx multilayer films remain resistant to blistering and flaking up to fluence of 8·1016 cm−2. The investigations have shown influence of the crystalline and amorphous layer thicknesses on the character and damage degree of the multilayer films surface as a result of post-radiation annealing at 600 °C. In this work potential processes (mechanisms) of blister formation and flacking in ZrN/SiNx multilayer systems are discussed.

Original languageEnglish
Pages (from-to)170-176
Number of pages7
JournalSurface and Coatings Technology
Volume344
DOIs
Publication statusPublished - 25 Jun 2018

Fingerprint

blisters
Multilayer films
Multilayers
Irradiation
irradiation
Ions
Vacuum
Sputter deposition
flaking
Surface morphology
Sputtering
vacuum
ions
Atomic force microscopy
Annealing
Crystalline materials
Transmission electron microscopy
Scanning
plasma jets
Plasmas

Keywords

  • Blisters
  • Flaking
  • Irradiation
  • Multilayer films
  • Vacuum annealing

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Uglov, V. V., Abadias, G., Zlotski, S. V., Kvasov, N. T., Saladukhin, I. A., & Malashevih, A. A. (2018). Blister formation in ZrN/SiN multilayers after He irradiation. Surface and Coatings Technology, 344, 170-176. https://doi.org/10.1016/j.surfcoat.2018.02.095

Blister formation in ZrN/SiN multilayers after He irradiation. / Uglov, V. V.; Abadias, G.; Zlotski, S. V.; Kvasov, N. T.; Saladukhin, I. A.; Malashevih, A. A.

In: Surface and Coatings Technology, Vol. 344, 25.06.2018, p. 170-176.

Research output: Contribution to journalArticle

Uglov, VV, Abadias, G, Zlotski, SV, Kvasov, NT, Saladukhin, IA & Malashevih, AA 2018, 'Blister formation in ZrN/SiN multilayers after He irradiation', Surface and Coatings Technology, vol. 344, pp. 170-176. https://doi.org/10.1016/j.surfcoat.2018.02.095
Uglov, V. V. ; Abadias, G. ; Zlotski, S. V. ; Kvasov, N. T. ; Saladukhin, I. A. ; Malashevih, A. A. / Blister formation in ZrN/SiN multilayers after He irradiation. In: Surface and Coatings Technology. 2018 ; Vol. 344. pp. 170-176.
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