Bismuth(III) doped polymer layers for telecommunication applications

V. Prajzler, O. Lyutakov, I. Huttel, J. Oswald, V. Machovic, V. Jerâbek

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Bismuth(III)-doped Epoxy Novolak Resin as a novel promising photonics material was designed for applications in 1310 nm. The samples was fabricated by spin-coating and its optical properties are evaluated in the terms on Bismuth(III) concentration.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009
DOIs
Publication statusPublished - 1 Dec 2009
Externally publishedYes
EventConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009 - Shanghai, China
Duration: 30 Aug 20093 Sep 2009

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009
CountryChina
CityShanghai
Period30.8.093.9.09

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Keywords

  • Bismuth Luminescence
  • Epoxy Novolak Resin

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Prajzler, V., Lyutakov, O., Huttel, I., Oswald, J., Machovic, V., & Jerâbek, V. (2009). Bismuth(III) doped polymer layers for telecommunication applications. In Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009 [5292489] (Optics InfoBase Conference Papers). https://doi.org/10.1109/CLEOPR.2009.5292489