Behavior of macroparticles near and on a substrate immersed in a vacuum arc plasma at negative high-frequency short-pulsed biasing

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

It was found that the negative repetitive pulsed biasing of a substrate with respect to the adjacent plasma significantly reduce the macroparticles (MPs) content on surface. The decrease of MPs on the negative potential substrate surface is caused by several different physical mechanisms. Up to 10% of macroparticles can be repulsed from the plasma-substrate voltage drop after being negatively charged in plasma. The MPs surface density on substrate can be significantly reduced after MPs interaction with negatively biased metal surface. This physical mechanism of negatively charged MPs electrostatic repulsion disappears when tungsten grid is used to create a sheath near the substrate surface. Reduction of MPs surface density almost by half takes a place due to ion sputtering. The decrease of MPs surface density by factor of 12 was achieved after the treatment of substrate for 2 min.

Original languageEnglish
Title of host publicationProceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012
DOIs
Publication statusPublished - 2012
Event2012 7th International Forum on Strategic Technology, IFOST 2012 - Tomsk, Russian Federation
Duration: 18 Sep 201221 Sep 2012

Other

Other2012 7th International Forum on Strategic Technology, IFOST 2012
CountryRussian Federation
CityTomsk
Period18.9.1221.9.12

Fingerprint

Vacuum
Plasmas
Substrates
Plasma
Substrate
Sputtering
Tungsten
Electrostatics
Ions
Metals

Keywords

  • high-frequency short-pulse negative bias potencial
  • macroparticle
  • surface density
  • vacuum-arc plasma

ASJC Scopus subject areas

  • Management of Technology and Innovation

Cite this

Behavior of macroparticles near and on a substrate immersed in a vacuum arc plasma at negative high-frequency short-pulsed biasing. / Ryabchikov, A. I.; Sivin, Denis Olegovich; Bumagina, A. I.

Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012. 2012. 6357763.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ryabchikov, AI, Sivin, DO & Bumagina, AI 2012, Behavior of macroparticles near and on a substrate immersed in a vacuum arc plasma at negative high-frequency short-pulsed biasing. in Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012., 6357763, 2012 7th International Forum on Strategic Technology, IFOST 2012, Tomsk, Russian Federation, 18.9.12. https://doi.org/10.1109/IFOST.2012.6357763
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AB - It was found that the negative repetitive pulsed biasing of a substrate with respect to the adjacent plasma significantly reduce the macroparticles (MPs) content on surface. The decrease of MPs on the negative potential substrate surface is caused by several different physical mechanisms. Up to 10% of macroparticles can be repulsed from the plasma-substrate voltage drop after being negatively charged in plasma. The MPs surface density on substrate can be significantly reduced after MPs interaction with negatively biased metal surface. This physical mechanism of negatively charged MPs electrostatic repulsion disappears when tungsten grid is used to create a sheath near the substrate surface. Reduction of MPs surface density almost by half takes a place due to ion sputtering. The decrease of MPs surface density by factor of 12 was achieved after the treatment of substrate for 2 min.

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