Arc plasma-assisted deposition of nanocrystalline coatings

O. V. Krysina, N. N. Koval, Yu F. Ivanov, V. V. Shugurov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The paper considers peculiarities of vacuum arc plasma-assisted deposition of multicomponent nanocrystalline coatings based on titanium nitride. Advantages and prospects of the modified ion plasma setup used for coating deposition are described. The effect of added elements on the structural phase state and characteristics of titanium nitride-based coatings is demonstrated.

Original languageEnglish
Title of host publicationProceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
Pages537-540
Number of pages4
DOIs
Publication statusPublished - 2012
Event25th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2012 - Tomsk, Russian Federation
Duration: 2 Sep 20127 Sep 2012

Other

Other25th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2012
CountryRussian Federation
CityTomsk
Period2.9.127.9.12

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Software

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    Krysina, O. V., Koval, N. N., Ivanov, Y. F., & Shugurov, V. V. (2012). Arc plasma-assisted deposition of nanocrystalline coatings. In Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV (pp. 537-540). [6412574] https://doi.org/10.1109/DEIV.2012.6412574