Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications

Roman Elashnikov, Jaromír Háša, Lukáš Děkanovský, Jaroslav Otta, Přemysl Fitl, Václav Švorčík, Oleksiy Lyutakov

Research output: Contribution to journalArticle


Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.

Original languageEnglish
Pages (from-to)5534-5539
Number of pages6
JournalACS Omega
Issue number3
Publication statusPublished - 19 Mar 2019
Externally publishedYes


ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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