Abstract
Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.
| Original language | English |
|---|---|
| Pages (from-to) | 5534-5539 |
| Number of pages | 6 |
| Journal | ACS Omega |
| Volume | 4 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 19 Mar 2019 |
| Externally published | Yes |
Fingerprint
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)
Cite this
Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications. / Elashnikov, Roman; Háša, Jaromír; Děkanovský, Lukáš; Otta, Jaroslav; Fitl, Přemysl; Švorčík, Václav; Lyutakov, Oleksiy.
In: ACS Omega, Vol. 4, No. 3, 19.03.2019, p. 5534-5539.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
AU - Elashnikov, Roman
AU - Háša, Jaromír
AU - Děkanovský, Lukáš
AU - Otta, Jaroslav
AU - Fitl, Přemysl
AU - Švorčík, Václav
AU - Lyutakov, Oleksiy
PY - 2019/3/19
Y1 - 2019/3/19
N2 - Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.
AB - Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.
UR - http://www.scopus.com/inward/record.url?scp=85063190971&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85063190971&partnerID=8YFLogxK
U2 - 10.1021/acsomega.8b03039
DO - 10.1021/acsomega.8b03039
M3 - Article
VL - 4
SP - 5534
EP - 5539
JO - ACS Omega
JF - ACS Omega
SN - 2470-1343
IS - 3
ER -