Application of photoelasticity for analysis of residual stresses in CDs

S. I. Gerasimov, N. S. Bachurina, N. N. Emelyanova

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

Residual stresses appeared with time due to the imperfection of the material production process. Sometimes the redistribution of residual stresses is the reason of cracks initiation in the tested object on one of the manufacturing stages or this redistribution increases them up to the critical value, when a small external load results in breakage of this object. Relaxation is the main reason of redistribution of residual stresses and it can occur without external influence or if there is heating, static and cyclic loads. Relaxation results in change of the sizes and shapes of the tested object. The dimensional stability is especially important in modern high technologies, in particular in the use of compact discs for the storage of information. Modern CDs are produced from polycarbonate, possessing an effect of birefringence. It allows to make an estimation of stresses at CDs by the method of photoelasticity. A metallized coating put on one of a CD surfaces provides ideal conditions for registration of interference picture observed in the reflected light. When investigating the stresses in CDs with the use of reflective V-type plane polariscope the solving equations become similar to those used in a photoelastic coating method. The present work discusses the results of the research of the residual stresses in CDs with various operation time produced by various firms and by different technologies (punching, laser recording). A simple optical method of the NDT of CDs at various stages of their manufacturing is offered.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsY.V. Chugui, S.N. Bagayev, A. Weckenmann, P.H. Osanna
Pages606-610
Number of pages5
Volume4900
Edition1
DOIs
Publication statusPublished - 2002
EventSeventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life - Novosibirsk, Russian Federation
Duration: 9 Sep 200213 Sep 2002

Other

OtherSeventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life
CountryRussian Federation
CityNovosibirsk
Period9.9.0213.9.02

Fingerprint

photoelasticity
Photoelasticity
residual stress
Residual stresses
Laser recording
manufacturing
Polariscopes
polariscopes
cyclic loads
static loads
dimensional stability
Coatings
Punching
Cyclic loads
Dimensional stability
crack initiation
polycarbonates
Polycarbonates
Birefringence
Nondestructive examination

Keywords

  • CD
  • Photoelasticity
  • Residual stresses

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Gerasimov, S. I., Bachurina, N. S., & Emelyanova, N. N. (2002). Application of photoelasticity for analysis of residual stresses in CDs. In Y. V. Chugui, S. N. Bagayev, A. Weckenmann, & P. H. Osanna (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (1 ed., Vol. 4900, pp. 606-610) https://doi.org/10.1117/12.484619

Application of photoelasticity for analysis of residual stresses in CDs. / Gerasimov, S. I.; Bachurina, N. S.; Emelyanova, N. N.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Y.V. Chugui; S.N. Bagayev; A. Weckenmann; P.H. Osanna. Vol. 4900 1. ed. 2002. p. 606-610.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Gerasimov, SI, Bachurina, NS & Emelyanova, NN 2002, Application of photoelasticity for analysis of residual stresses in CDs. in YV Chugui, SN Bagayev, A Weckenmann & PH Osanna (eds), Proceedings of SPIE - The International Society for Optical Engineering. 1 edn, vol. 4900, pp. 606-610, Seventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life, Novosibirsk, Russian Federation, 9.9.02. https://doi.org/10.1117/12.484619
Gerasimov SI, Bachurina NS, Emelyanova NN. Application of photoelasticity for analysis of residual stresses in CDs. In Chugui YV, Bagayev SN, Weckenmann A, Osanna PH, editors, Proceedings of SPIE - The International Society for Optical Engineering. 1 ed. Vol. 4900. 2002. p. 606-610 https://doi.org/10.1117/12.484619
Gerasimov, S. I. ; Bachurina, N. S. ; Emelyanova, N. N. / Application of photoelasticity for analysis of residual stresses in CDs. Proceedings of SPIE - The International Society for Optical Engineering. editor / Y.V. Chugui ; S.N. Bagayev ; A. Weckenmann ; P.H. Osanna. Vol. 4900 1. ed. 2002. pp. 606-610
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