Application of high frequency short-pulsed negative biasing for the decreasing of macroparticle content on substrate immersed in vacuum arc plasma

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6 Citations (Scopus)

Abstract

The result of experimental study of macroparticles (MPs) accumulation on negatively biased substrate immersed in DC vacuum arc titanium plasma are presented. It was found that the negative high frequency short pulse biasing of substrate with respect to the adjacent plasma significantly reduces the MPs content on substrate surface. It was shown that the decreasing of MPs surface number density on a negatively biased substrate is determined by the pulse duration, pulse amplitude and processing time. The surface density of MPs with the size <1.5 μm was decreased 1500-fold at the bias pulse repetition rate 105 pulse per second (p.p.s.), bias potential -2 kV, pulse duration 8 μs and processing time 9-18 min. The total MPs surface density in these cases was decreased 67-fold.

Original languageEnglish
Pages (from-to)130-133
Number of pages4
JournalApplied Surface Science
Volume310
DOIs
Publication statusPublished - 15 Aug 2014

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Vacuum
Plasmas
Substrates
Pulse repetition rate
Processing
Titanium
Laser pulses

Keywords

  • Macroparticles
  • Metal plasma
  • Negative high-frequency short-pulsed bias
  • Vacuum-arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

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title = "Application of high frequency short-pulsed negative biasing for the decreasing of macroparticle content on substrate immersed in vacuum arc plasma",
abstract = "The result of experimental study of macroparticles (MPs) accumulation on negatively biased substrate immersed in DC vacuum arc titanium plasma are presented. It was found that the negative high frequency short pulse biasing of substrate with respect to the adjacent plasma significantly reduces the MPs content on substrate surface. It was shown that the decreasing of MPs surface number density on a negatively biased substrate is determined by the pulse duration, pulse amplitude and processing time. The surface density of MPs with the size <1.5 μm was decreased 1500-fold at the bias pulse repetition rate 105 pulse per second (p.p.s.), bias potential -2 kV, pulse duration 8 μs and processing time 9-18 min. The total MPs surface density in these cases was decreased 67-fold.",
keywords = "Macroparticles, Metal plasma, Negative high-frequency short-pulsed bias, Vacuum-arc",
author = "Ryabchikov, {A. I.} and Sivin, {Denis Olegovich} and Bumagina, {A. I.}",
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T1 - Application of high frequency short-pulsed negative biasing for the decreasing of macroparticle content on substrate immersed in vacuum arc plasma

AU - Ryabchikov, A. I.

AU - Sivin, Denis Olegovich

AU - Bumagina, A. I.

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N2 - The result of experimental study of macroparticles (MPs) accumulation on negatively biased substrate immersed in DC vacuum arc titanium plasma are presented. It was found that the negative high frequency short pulse biasing of substrate with respect to the adjacent plasma significantly reduces the MPs content on substrate surface. It was shown that the decreasing of MPs surface number density on a negatively biased substrate is determined by the pulse duration, pulse amplitude and processing time. The surface density of MPs with the size <1.5 μm was decreased 1500-fold at the bias pulse repetition rate 105 pulse per second (p.p.s.), bias potential -2 kV, pulse duration 8 μs and processing time 9-18 min. The total MPs surface density in these cases was decreased 67-fold.

AB - The result of experimental study of macroparticles (MPs) accumulation on negatively biased substrate immersed in DC vacuum arc titanium plasma are presented. It was found that the negative high frequency short pulse biasing of substrate with respect to the adjacent plasma significantly reduces the MPs content on substrate surface. It was shown that the decreasing of MPs surface number density on a negatively biased substrate is determined by the pulse duration, pulse amplitude and processing time. The surface density of MPs with the size <1.5 μm was decreased 1500-fold at the bias pulse repetition rate 105 pulse per second (p.p.s.), bias potential -2 kV, pulse duration 8 μs and processing time 9-18 min. The total MPs surface density in these cases was decreased 67-fold.

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