Abstract
The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.
| Original language | English |
|---|---|
| Pages (from-to) | 1-7 |
| Number of pages | 7 |
| Journal | Russian Physics Journal |
| DOIs | |
| Publication status | Accepted/In press - 20 Oct 2016 |
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Keywords
- high-frequency short-pulse negative bias potential
- metal plasma
- microdrop fraction
- vacuum-arc discharge
ASJC Scopus subject areas
- Physics and Astronomy(all)
Cite this
Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles. / Ryabchikov, A. I.; Anan'in, Peter Semenovich; Shevelev, A. E.
In: Russian Physics Journal, 20.10.2016, p. 1-7.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles
AU - Ryabchikov, A. I.
AU - Anan'in, Peter Semenovich
AU - Shevelev, A. E.
PY - 2016/10/20
Y1 - 2016/10/20
N2 - The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.
AB - The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.
KW - high-frequency short-pulse negative bias potential
KW - metal plasma
KW - microdrop fraction
KW - vacuum-arc discharge
UR - http://www.scopus.com/inward/record.url?scp=84991826926&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84991826926&partnerID=8YFLogxK
U2 - 10.1007/s11182-016-0851-3
DO - 10.1007/s11182-016-0851-3
M3 - Article
SP - 1
EP - 7
JO - Russian Physics Journal
JF - Russian Physics Journal
SN - 1064-8887
ER -