Abstract
Poly(methyl methacrylate) (PMMA) surface was patterned by laser scanning and Ga and Au layers of different thicknesses were sputtered onto modified polymer surface. The metal/PMMA structures were annealed at 160 C for 1 h and the changes in the surface morphology were examined by AFM and STM techniques. It was found that sufficiently thick and continuous metal coverage protect the underlying pattern structure.
| Original language | English |
|---|---|
| Pages (from-to) | 3541-3545 |
| Number of pages | 5 |
| Journal | Journal of Materials Science: Materials in Electronics |
| Volume | 24 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 1 Sep 2013 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Electrical and Electronic Engineering
Cite this
Annealing of laser patterned PMMA coated with gold and gallium. / Lyutakov, O.; Tuma, J.; Kalachyova, Y.; Huttel, I.; Prajzler, V.; Svorcik, V.
In: Journal of Materials Science: Materials in Electronics, Vol. 24, No. 9, 01.09.2013, p. 3541-3545.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Annealing of laser patterned PMMA coated with gold and gallium
AU - Lyutakov, O.
AU - Tuma, J.
AU - Kalachyova, Y.
AU - Huttel, I.
AU - Prajzler, V.
AU - Svorcik, V.
PY - 2013/9/1
Y1 - 2013/9/1
N2 - Poly(methyl methacrylate) (PMMA) surface was patterned by laser scanning and Ga and Au layers of different thicknesses were sputtered onto modified polymer surface. The metal/PMMA structures were annealed at 160 C for 1 h and the changes in the surface morphology were examined by AFM and STM techniques. It was found that sufficiently thick and continuous metal coverage protect the underlying pattern structure.
AB - Poly(methyl methacrylate) (PMMA) surface was patterned by laser scanning and Ga and Au layers of different thicknesses were sputtered onto modified polymer surface. The metal/PMMA structures were annealed at 160 C for 1 h and the changes in the surface morphology were examined by AFM and STM techniques. It was found that sufficiently thick and continuous metal coverage protect the underlying pattern structure.
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UR - http://www.scopus.com/inward/citedby.url?scp=84882711589&partnerID=8YFLogxK
U2 - 10.1007/s10854-013-1282-3
DO - 10.1007/s10854-013-1282-3
M3 - Article
VL - 24
SP - 3541
EP - 3545
JO - Journal of Materials Science: Materials in Electronics
JF - Journal of Materials Science: Materials in Electronics
SN - 0957-4522
IS - 9
ER -