Analysis of the electron energy distribution function in a copper-vapor laser with modified kinetics

A. M. Boichenko, G. S. Evtushenko, S. I. Yakovlenko, O. V. Zhdaneev

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The electron energy distribution function (EEDF) is calculated for active media of a conventional copper-vapor laser (CVL) and CVLs with cesium, hydrogen, and hydrogen chloride impurities. It is demonstrated that the EEDF is neither a Maxwell nor a Druyvestein distribution function. The main difference between the real and Maxwell EEDFs is seen in the high-energy part of the EEDF. This leads to a significant (more than fivefold) decrease in the excitation and ionization rates of the buffer gas (neon) atoms. Nevertheless, in spite of the difference between the real and Maxwell EEDFs in the CVL active medium, the latter distribution can be used in the kinetic models of CVLs.

Original languageEnglish
Pages (from-to)922-929
Number of pages8
JournalLaser Physics
Issue number7
Publication statusPublished - Jul 2004


ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Physics and Astronomy (miscellaneous)

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