Abstract
A nonstationary kinetic model of the active medium of a copper-vapor laser (λ = 510.6 and 578.2 nm) with hydrogen chloride impurities is constructed. A theoretical analysis of the existing concepts regarding the increase in the lasing parameters of a copper-vapor laser with hydrogen chloride impurities in the active medium is presented. It is demonstrated that the effect of hydrogen chloride at high repetition rates of the excitation pulses differs from the effect at low repetition rates. At low repetition rates, the main contribution to the increase in the laser energy is related to the increase in the concentration of copper atoms in the ground state in the active medium, whereas at high repetition rates (higher than 50 kHz) the main reason is the decrease in the prepulse electron concentration.
| Original language | English |
|---|---|
| Pages (from-to) | 930-952 |
| Number of pages | 23 |
| Journal | Laser Physics |
| Volume | 14 |
| Issue number | 7 |
| Publication status | Published - Jul 2004 |
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ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Physics and Astronomy (miscellaneous)
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Analysis of the effect of hydrogen chloride impurities on the copper-vapor laser performance. / Boichenko, A. M.; Evtushenko, G. S.; Yakovlenko, S. I.; Zhdaneev, O. V.
In: Laser Physics, Vol. 14, No. 7, 07.2004, p. 930-952.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Analysis of the effect of hydrogen chloride impurities on the copper-vapor laser performance
AU - Boichenko, A. M.
AU - Evtushenko, G. S.
AU - Yakovlenko, S. I.
AU - Zhdaneev, O. V.
PY - 2004/7
Y1 - 2004/7
N2 - A nonstationary kinetic model of the active medium of a copper-vapor laser (λ = 510.6 and 578.2 nm) with hydrogen chloride impurities is constructed. A theoretical analysis of the existing concepts regarding the increase in the lasing parameters of a copper-vapor laser with hydrogen chloride impurities in the active medium is presented. It is demonstrated that the effect of hydrogen chloride at high repetition rates of the excitation pulses differs from the effect at low repetition rates. At low repetition rates, the main contribution to the increase in the laser energy is related to the increase in the concentration of copper atoms in the ground state in the active medium, whereas at high repetition rates (higher than 50 kHz) the main reason is the decrease in the prepulse electron concentration.
AB - A nonstationary kinetic model of the active medium of a copper-vapor laser (λ = 510.6 and 578.2 nm) with hydrogen chloride impurities is constructed. A theoretical analysis of the existing concepts regarding the increase in the lasing parameters of a copper-vapor laser with hydrogen chloride impurities in the active medium is presented. It is demonstrated that the effect of hydrogen chloride at high repetition rates of the excitation pulses differs from the effect at low repetition rates. At low repetition rates, the main contribution to the increase in the laser energy is related to the increase in the concentration of copper atoms in the ground state in the active medium, whereas at high repetition rates (higher than 50 kHz) the main reason is the decrease in the prepulse electron concentration.
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UR - http://www.scopus.com/inward/citedby.url?scp=4444273925&partnerID=8YFLogxK
M3 - Article
VL - 14
SP - 930
EP - 952
JO - Laser Physics
JF - Laser Physics
SN - 1054-660X
IS - 7
ER -