Analysis of concentration field formation in titanium under aluminum ion implantation via a gas-and-metal film deposited on a target surface

G. A. Vershinin, T. S. Grekova, G. I. Gering, I. A. Kurzina, Yu P. Sharkeev

Research output: Contribution to journalArticlepeer-review

Abstract

The concentration profiles of aluminum ions in polycrystalline titanium implanted by the polychromatic beam from a vacuum arc source via a gas-and-metal film deposited on a target surface are analyzed.

Original languageEnglish
Pages (from-to)251-254
Number of pages4
JournalJournal of Surface Investigation
Volume6
Issue number2
DOIs
Publication statusPublished - Apr 2012

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Analysis of concentration field formation in titanium under aluminum ion implantation via a gas-and-metal film deposited on a target surface'. Together they form a unique fingerprint.

Cite this