An implanter with a mixed ion beam for modifying the properties of the surface of construction materials

G. V. Potemkin

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    2 Citations (Scopus)

    Abstract

    An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.

    Original languageEnglish
    Pages (from-to)103-108
    Number of pages6
    JournalRussian Journal of Non-Ferrous Metals
    Volume52
    Issue number1
    DOIs
    Publication statusPublished - Feb 2011

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    Keywords

    • ion source
    • mixed ion source
    • modifying
    • sputtering
    • vapor-gas plasma

    ASJC Scopus subject areas

    • Mechanics of Materials
    • Metals and Alloys
    • Surfaces, Coatings and Films

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