Abstract
An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.
| Original language | English |
|---|---|
| Pages (from-to) | 103-108 |
| Number of pages | 6 |
| Journal | Russian Journal of Non-Ferrous Metals |
| Volume | 52 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Feb 2011 |
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Keywords
- ion source
- mixed ion source
- modifying
- sputtering
- vapor-gas plasma
ASJC Scopus subject areas
- Mechanics of Materials
- Metals and Alloys
- Surfaces, Coatings and Films
Cite this
An implanter with a mixed ion beam for modifying the properties of the surface of construction materials. / Potemkin, G. V.
In: Russian Journal of Non-Ferrous Metals, Vol. 52, No. 1, 02.2011, p. 103-108.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - An implanter with a mixed ion beam for modifying the properties of the surface of construction materials
AU - Potemkin, G. V.
PY - 2011/2
Y1 - 2011/2
N2 - An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.
AB - An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.
KW - ion source
KW - mixed ion source
KW - modifying
KW - sputtering
KW - vapor-gas plasma
UR - http://www.scopus.com/inward/record.url?scp=79952456443&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79952456443&partnerID=8YFLogxK
U2 - 10.3103/S1067821211010202
DO - 10.3103/S1067821211010202
M3 - Article
AN - SCOPUS:79952456443
VL - 52
SP - 103
EP - 108
JO - Russian Journal of Non-Ferrous Metals
JF - Russian Journal of Non-Ferrous Metals
SN - 1067-8212
IS - 1
ER -