An implanter with a mixed ion beam for modifying the properties of the surface of construction materials

Abstract

An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me⁺/G⁺ ions in the accelerator, which works like a bipolar diode.

Original language	English
Pages (from-to)	103-108
Number of pages	6
Journal	Russian Journal of Non-Ferrous Metals
Volume	52
Issue number	1
DOIs	https://doi.org/10.3103/S1067821211010202
Publication status	Published - Feb 2011

Keywords

ion source
mixed ion source
modifying
sputtering
vapor-gas plasma

ASJC Scopus subject areas

Mechanics of Materials
Metals and Alloys
Surfaces, Coatings and Films

Access to Document

10.3103/S1067821211010202

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abstract = "An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.",

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