Abstract
An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.
Original language | English |
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Pages (from-to) | 103-108 |
Number of pages | 6 |
Journal | Russian Journal of Non-Ferrous Metals |
Volume | 52 |
Issue number | 1 |
DOIs | |
Publication status | Published - Feb 2011 |
Keywords
- ion source
- mixed ion source
- modifying
- sputtering
- vapor-gas plasma
ASJC Scopus subject areas
- Mechanics of Materials
- Metals and Alloys
- Surfaces, Coatings and Films