Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit

D. V. Sidelev, A. V. Yuryeva, V. P. Krivobokov, A. S. Shabunin, M. S. Syrtanov, Z. Koishybayeva

Research output: Contribution to journalArticle

5 Citations (Scopus)

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Physics & Astronomy