A study on the energy distribution for grid-assisting magnetron sputtering

Min J. Jung, Yun M. Chung, J. Houska, P. Baroch, J. Vlcek, J. Musil, K. H. Nam, Jeon G. Han

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The Ti film deposited by grid-attached magnetron sputtering possesses mirror-like surface RMS roughness of 0.6∼1.3 nm. On the other hand, Ti film deposited by conventional magnetron sputtering possesses a steeply increased RMS surface roughness of 6 nm. The cross-sectional TEM micrographs indicated that Ti coating by conventional process was composed of large columnar structures. But Ti coating using two grid-attached magnetron type had a fine structures. By introducing a grid, the energy spectra of ions were characterized by a more extended high energy tail as compared to conventional magnetron sputtering. Therefore, more energetic ion bombardment generally enhances the depositing atom mobility in the case of the grid system as compared to the conventional system.

Original languageEnglish
Pages (from-to)421-424
Number of pages4
JournalSurface and Coatings Technology
Volume200
Issue number1-4 SPEC. ISS.
DOIs
Publication statusPublished - 1 Oct 2005

Keywords

  • Grid
  • Ion bombardment
  • Magnetron sputtering
  • Roughness
  • Titanium

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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    Jung, M. J., Chung, Y. M., Houska, J., Baroch, P., Vlcek, J., Musil, J., Nam, K. H., & Han, J. G. (2005). A study on the energy distribution for grid-assisting magnetron sputtering. Surface and Coatings Technology, 200(1-4 SPEC. ISS.), 421-424. https://doi.org/10.1016/j.surfcoat.2005.03.005